Effect of Annealing Temperature on the Coercivity and the Electrical Resistivity of the Electroplated Ni-Fe-W Alloy Film

Abstract

80Ni-17Fe-3W alloy films are electroplated on Si wafer. The as-plated film is smoothed and annealed at different substrate temperature values of 200 °C, 300 °C, 400 °C, and 500 °C. The atomic force microscopy results show that the roughness of the as-plated alloy film increases with an increase in the annealing temperature. It is found that an increase in the annealing temperature, the coercivity increases while the electrical resistivity decreases. The plated alloy film annealed at 500 °C has the highest coercivity of 383 A/m and the lowest resistivity of 25 µohm-cm. The coercivity and electrical resistivity of the samples are measured with the help of a BH-Looper and four-point probe techniques, respectively.

Printed Thick Film Resistance Temperature Detector for Real-Time Tube Furnace Temperature Monitoring

“…The corresponding resistivity statistical values distribute in the ranges of 5.2-121.1 µΩ•cm with a difference of more than 20-fold. This is because the mechanical properties, electrical characteristics, and grain size of the alloy are significantly influenced at various annealing temperatures [46]. The results above indicate that the temperature field within the tube furnace can be effectively monitored through the fabricated Ag RTD temperature measuring ring, enabling the health monitoring of the tube furnace and assessment of the sintering quality of specimens.…”