2021
DOI: 10.1016/j.apsadv.2021.100137
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Effect of annealing temperature on microstructure and mechanical response of sputter deposited Ti-Zr-Mo high temperature shape memory alloy thin films

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Cited by 10 publications
(4 citation statements)
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“…[4,6,7]. The measured alloys are Ti− (16,18,23,24)Nb−3Al [6], Ti−24Nb−(0-4)Al [4], and Ti−22Nb−(4-8)Ta [7] ternary alloys. For completeness, Ti−22Nb [7] and Ti−24Nb [6] binary alloys are also displayed.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…[4,6,7]. The measured alloys are Ti− (16,18,23,24)Nb−3Al [6], Ti−24Nb−(0-4)Al [4], and Ti−22Nb−(4-8)Ta [7] ternary alloys. For completeness, Ti−22Nb [7] and Ti−24Nb [6] binary alloys are also displayed.…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, there was a correlation between Ms and C44, implying that an elastic modulus [4,6] and Ti-Nb-Ta [7] ternary alloys are shown for comparison. Note that the available measured alloy compositions are Ti− (16,18,23,24)Nb−3Al [6] and Ti−24Nb−(1-4)Al [4] for Ti-Nb-Al alloys and Ti−22Nb−(4-8)Ta [7] for Ti−Nb−Ta alloys. For completeness, the M s of Ti−22Nb [7] and Ti−24Nb [4] are also displayed.…”
Section: Discussionmentioning
confidence: 99%
“…Strong structural modifications induced by high-intensity ultra-short laser pulses could be modified by a post-processing steps of high temperature annealing (HTA) as recently demonstrated for micro-optical elements laser ablated out of crystalline sapphire Al 2 O 3 [13]. HTA is a commonly used process for changing the surface morphology of different materials [14][15][16][17]. It has been used to make the particle size of high-temperature alloy thin films smaller [14], to create ceramic devices from polymers [17], and to smooth out germanium layers on silicon substrates [15] and terraces of chemically etched SrTiO 3 [16].…”
Section: Introduction: High Intensity > Tw/cm 2 Crystal Processingmentioning
confidence: 99%
“…HTA is a commonly used process for changing the surface morphology of different materials [14][15][16][17]. It has been used to make the particle size of high-temperature alloy thin films smaller [14], to create ceramic devices from polymers [17], and to smooth out germanium layers on silicon substrates [15] and terraces of chemically etched SrTiO 3 [16]. The roughness evolution of rapidly annealed surfaces is well understood; as the annealing time increases, the roughness decreases linearly [18].…”
Section: Introduction: High Intensity > Tw/cm 2 Crystal Processingmentioning
confidence: 99%