2016
DOI: 10.15407/ujpe61.04.0325
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Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-By-Layer Using Magnetron Sputtering

Abstract: ZnO:Al films are deposited layer-by-layer onto silicon and glass substrates, by using the radiofrequency magnetron sputtering method at various argon pressures from 0.5 to 2 Pa in a deposition chamber. The influence of this pressure on the structure and the optical and electrical properties of ZnO:Al films is studied. Higher argon pressures are found to reduce the electron mobility in transparent conductive ZnO:Al films and to worsen their conducting properties owing to the free electron scattering by grain bo… Show more

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Cited by 3 publications
(1 citation statement)
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“…In addition to chemical methods for the synthesis of thin nanostructured zinc oxide films, various methods for obtaining such materials are also widely used. For example, in [6], ZnO:Al thin films were deposited on solid substrates by layer-by-layer deposition in a high-frequency magnetron, and in [7], the results of a study of the structure, morphology, and luminescence of ZnO nanostructures, which were synthesized by electrothermal and electric discharge sputtering, are presented. In a significant number of cases, the method of pulsed laser deposition is also used [8].…”
Section: Introductionmentioning
confidence: 99%
“…In addition to chemical methods for the synthesis of thin nanostructured zinc oxide films, various methods for obtaining such materials are also widely used. For example, in [6], ZnO:Al thin films were deposited on solid substrates by layer-by-layer deposition in a high-frequency magnetron, and in [7], the results of a study of the structure, morphology, and luminescence of ZnO nanostructures, which were synthesized by electrothermal and electric discharge sputtering, are presented. In a significant number of cases, the method of pulsed laser deposition is also used [8].…”
Section: Introductionmentioning
confidence: 99%