2023
DOI: 10.1016/j.vacuum.2023.112013
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Effect of basal plane bending on the atomic step morphology of the 4H–SiC substrate surface

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Cited by 2 publications
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“…Among the many methods for the preparation of SiC [6,7], the physical vapor transport (PVT) method is one of the most mature methods for growing bulk SiC crystals, during which a large number of dislocations are generated. Thus, the control and reduction of dislocations, especially basal plane dislocation (BPD), has been one of the most important issues [8][9][10][11][12] in improving the quality of SiC wafers. It is well known that BPD degrades SiC pn-junction diodes after long-term forward voltage operation or increases the leakage current in the blocking mode of SiC power MOSFETs and JFETs [13,14], restricting the application of SiC devices.…”
Section: Introductionmentioning
confidence: 99%
“…Among the many methods for the preparation of SiC [6,7], the physical vapor transport (PVT) method is one of the most mature methods for growing bulk SiC crystals, during which a large number of dislocations are generated. Thus, the control and reduction of dislocations, especially basal plane dislocation (BPD), has been one of the most important issues [8][9][10][11][12] in improving the quality of SiC wafers. It is well known that BPD degrades SiC pn-junction diodes after long-term forward voltage operation or increases the leakage current in the blocking mode of SiC power MOSFETs and JFETs [13,14], restricting the application of SiC devices.…”
Section: Introductionmentioning
confidence: 99%