2023
DOI: 10.1088/1402-4896/acd3c3
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Effect of bubbles at the bonded interface on the performance of GeSn/Si PIN photodetector

Abstract: Due to the large lattice mismatch between GeSn and Si materials, high-density threading dislocation (TD) forms when GeSn films are grown by epitaxial growth. This leads to the increase of the dark current density (DCD) of the device. The wafer-bonded technique is a promising method to prepare high-quality thin films. This has been used to produce the Si-based GeSn materials with low threading dislocation density (TDD). However, there are a lot of bubbles at the bonded interface, resulting in the deterioration … Show more

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“…This is why capacitance levels are slightly increased by the increase of light power. The interface states density (denominated by D it or Nss) [92,93] is another highly important parameter for metal-semiconductor (MS, MOS, or MIS type) diodes and photodiodes, which parameter affects their performances. Different reasons such as impurities, crystal lattice vacancies, and voids can cause the presence of interface states.…”
Section: ( ) =mentioning
confidence: 99%
“…This is why capacitance levels are slightly increased by the increase of light power. The interface states density (denominated by D it or Nss) [92,93] is another highly important parameter for metal-semiconductor (MS, MOS, or MIS type) diodes and photodiodes, which parameter affects their performances. Different reasons such as impurities, crystal lattice vacancies, and voids can cause the presence of interface states.…”
Section: ( ) =mentioning
confidence: 99%