“…Lately, the growth of VACNT have been reported on different conducting DBL materials, such as aluminium [4,23,25,46,51,56,[63][64][65][66][67][68][69][70][71][72][73], molybdenum aluminide [34,74], tantalum [62,75,76], tantalum nitride [77,78], titanium [79,80], titanium aluminide [47], titanium nitride [60,[81][82][83][84][85][86][87][88], metal silicide nitride [89][90][91], their stacking use, graphitic layer [92] and many others. Nowadays, researchers are using physical vapor deposition (PVD), atomic layer deposition (ALD) [86,93,94], or CVD techniques for the deposition of various conducting DBL.…”