2019
DOI: 10.1016/j.promfg.2019.06.024
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Effect of Chloride Electrolyte Additive on the Quality of Electrorefined Copper Cathode

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Cited by 12 publications
(6 citation statements)
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“…However, Aragón and Camus (2011) found that better quality copper cathode was obtained in the presence of chloride ions, because chloride reduces the grain size and improves the mechanical properties of the cathode. This is corroborated by a more recent study (Nkuna and Popoola, 2019), which indicates that a chloride ion concentration of 0.02 g/L gave a smoother and more compact cathode. However, nodules and irregularities formed on the cathode at a concentration above 0.025 g/L.…”
Section: Effect Of Chloride On Copper Electrowinningsupporting
confidence: 81%
See 1 more Smart Citation
“…However, Aragón and Camus (2011) found that better quality copper cathode was obtained in the presence of chloride ions, because chloride reduces the grain size and improves the mechanical properties of the cathode. This is corroborated by a more recent study (Nkuna and Popoola, 2019), which indicates that a chloride ion concentration of 0.02 g/L gave a smoother and more compact cathode. However, nodules and irregularities formed on the cathode at a concentration above 0.025 g/L.…”
Section: Effect Of Chloride On Copper Electrowinningsupporting
confidence: 81%
“…The influence of chloride ions contained in seawater on the solvent extraction (SX) process has also been studied, with the results being similar to use of fresh water, and sometimes even better (Shakibania et al, 2020). Additionally, in the copper electrowinning (EW) process, the presence of chloride ions at a concentration of 0.02 g/L can improve the compaction and smoothness of cathodes (Nkuna and Popoola, 2019).…”
Section: Use Of Seawater In Copper Hydrometallurgical Processesmentioning
confidence: 99%
“…The electrolyte additives enable the deposition of fine-grained copper cathodes and a smooth surface free from dendrites, and they counteract the growth of dendrites. They can be divided into leveling agents, ensuring the uniformity of the cathode deposit, and grain-refining agents, affecting the orientation of the crystals [8][9][10]. Currently known inhibitors of the industrial copper electrorefining process include glue, thiourea, avitone, and also inorganic chloride ions [11][12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Levelers are used to obtain smooth coatings since they locally decrease the copper electrodeposition rate on the surface protrusions and promote its growth in hollows, as a result of which the surface roughness of the copper deposit decreases. Nitrogen-containing heterocyclic and high-molecular compounds are among the most common levelers [28][29][30][31][32].…”
Section: Introductionmentioning
confidence: 99%
“…The morphology and film properties of copper deposits highly depend on the types and concentrations of additives [33], but their collective effect on the electroplating process is also important. Along with the abovementioned joint action of chloride ions with inhibitor or accelerator molecules, it is necessary to note possible synergistic [6,31,32,[34][35][36] and antagonistic [37] effects of additives of various types. The synergism of the additives enables a bright, dense, and smooth copper coating to be achieved.…”
Section: Introductionmentioning
confidence: 99%