2010
DOI: 10.1149/1.3337005
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Effect of Chlorine Concentration on Natural Pitting of Copper as a Function of Water Chemistry

Abstract: The cathodic reduction reaction kinetics of free chlorine and oxygen on UNS C11000 copper microelectrodes were investigated in Edwards synthetic drinking water. OCl− increases cathodic reaction rates and thus raises open-circuit potential (OCP) toward pitting potentials. An increase in both the mass-transport factor K (where ilim=Kω1/2 ) for chlorine reduction (HOCl and OCl− ) and OCP was observed as pH was increased from 8.5 to 9.5, and free chlorine levels were raised. Natural pitting was investigated … Show more

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Cited by 31 publications
(42 citation statements)
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“…Using CMEAs in relatively short-term experiments, Cong and Scully determined that chlorine levels as low as 1 mg/L could cause copper pitting (as indicated electrochemically) in a similar water quality as that used in the present work (i.e., control water with aluminum solids added); at lower pH, more chlorine was required to induce pitting [21]. They also showed that pitting severity (based on a computed "pitting factor" and maximum total anodic charge) increased with chlorine concentration, which may have been partially related to the short duration of the experiments (6 days) or the near stagnant conditions (i.e., chlorine levels depleted more rapidly at copper surface for low chlorine residual tests).…”
Section: Free Chlorinementioning
confidence: 71%
“…Using CMEAs in relatively short-term experiments, Cong and Scully determined that chlorine levels as low as 1 mg/L could cause copper pitting (as indicated electrochemically) in a similar water quality as that used in the present work (i.e., control water with aluminum solids added); at lower pH, more chlorine was required to induce pitting [21]. They also showed that pitting severity (based on a computed "pitting factor" and maximum total anodic charge) increased with chlorine concentration, which may have been partially related to the short duration of the experiments (6 days) or the near stagnant conditions (i.e., chlorine levels depleted more rapidly at copper surface for low chlorine residual tests).…”
Section: Free Chlorinementioning
confidence: 71%
“…Non-uniform corrosion of copper and copper alloys exposed to flow in this type of water has been confirmed by other researchers. [27][28][29][30] Water was synthesized from reagent-grade chemicals and deionized water to obtain the following quality: pH 9.2, 34 mg/L alkalinity (as CaCO 3 ), 13 mg/L SO 4 2− , 20 mg/L Cl − , 17 mg/L Ca 2+ , and 16 mg/L Na + . This served as a "base" water, which was amended in specific experiments (Table II).…”
Section: Methodsmentioning
confidence: 99%
“…One is a 5 × 20 MEA with a 25.4 mm cylindrical epoxy encasing, constructed from 150 μm diameter copper wires (UNS C11000) as described in detail elsewhere. 7,23 The other is a 5 × 20 MEA with a 25.4 mm (1 in) cylindrical copper encasing, mainly used in the Delrin crevice former study. Copper encasing was used to obtain a large covered metal area/crevice volume ratio.…”
Section: Methodsmentioning
confidence: 99%
“…6 Research has demonstrated that pitting corrosion of copper occurs in susceptible waters without aluminum solids. 7,8 However, the presence of aluminum solids increases the likelihood of pitting corrosion in certain water chemistries. 3,9,10 For instance, Edwards et al demonstrated that a synergistic reaction between free residual chlorine (5 ppm Cl 2 ) and aluminum solids (2 ppm Al-Al(OH) 3 ), created particularly aggressive pitting conditions for copper piping at the open circuit potential (OCP) in high pH (pH 9) potable water, based on a synthetic water recipe from Washington Suburban Sanitary Commission (WSSC).…”
mentioning
confidence: 99%