Effect of citric acid on photoelectrochemical properties of tungsten trioxide films prepared by the polymeric precursor method

Preparation of DyVO4/WO3 heterojunction plate array films with enhanced photoelectrochemical activity

“…The pure WO 3 lm has a band gap of about 2.70 eV, which is consistent with other reports. [28][29][30] With the contribution of DyVO 4 nanoparticles (E g ¼ 2.30 eV (ref. 12)), the DyVO 4 / WO 3 heterojunction lm has a narrower band gap of 2.68 eV.…”

Effect of citric acid on structure and photochromic properties of WO3–TiO2–ZnO composite films prepared by a sol–gel method

“…Especially, it can be stored for more than 30 days when the concentration of citric acid in precursor solution was higher than 0.6 M. The good homogeneous property could be ascribed to the coordination complex formation between WO 3 and citric acid [13].…”

“…Serving as an important surface ligand, citric acid is widely used in material synthesis for controlling both the size and morphology of material [11]. While used in the solgel technique, citric acid can coordinate with metal ions, greatly inhibiting metal ions segregation and making the precursor homogeneous [12][13]. Based on the valuable role of citric acid, we tried to synthesize the ternary WO 3 -TiO 2 -ZnO composite films on clear glass substrates by means of the sol-gel method using citric acid as a coordination agent.…”

Surface modification of InVO4 nanoparticles on WO3 plate array films for improved photoelectrochemical performance

“…The unmodied WO 3 lm has a E g of about 2.68 eV, which is in accordance with the previous reports. [34][35][36] With the surface modication of InVO 4 nanoparticles (E g ¼ 2.10 eV (ref. 32)), the optical band gap decreases to 2.65 eV.…”