“…In addition to characterizing the nonlinear refractive index of nanomaterials, [ 11,14 ] SSPM has also been developed for passive nonlinear photonic devices (e.g., all‐optical switches, [ 17 ] logic gates, [ 18 ] diodes, [ 19 ] isolators, [ 16 ] and information converters [ 20 ] ). It is noteworthy that many factors affect the far‐field self‐diffraction ring pattern, including the relative position of the sample to the focus of the focused beam, [ 21 ] the light intensity, [ 14 ] the wavelength, [ 17 ] the beam profile, [ 22 ] the solvent, [ 3 ] sample concentrations, [ 23 ] sample defects, [ 24 ] and absorption properties of materials. [ 25 ] To better study the SSPM phenomena of novel nanomaterials and develop their applications, it is very necessary to comprehensively understand the factors that contribute to the formation of self‐diffraction ring patterns.…”