J Mater Sci: Mater Electron
 2023
DOI: 10.1007/s10854-023-11155-6
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Effect of cover annealing on Cu2SnS3 thin films deposited by dual-source fine-channel mist chemical vapor deposition

Kunihiko Tanaka,
Kazuya Okamura,
Ren Saito
et al.
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