Effect of crystallisation on the magnetic properties of FeCuNbBSi amorphous thin films produced by sputtering

Abstract

Soft magnetic thin films of FeCuNbSiB alloy having different thickness were deposited on a Si3N4 substrate by rf sputtering. The target was made of amorphous ribbons having nominal composition Fe73.5Cu1Nb3Si13.5B9. The amorphicity of as‐deposited films has been checked by X‐ray diffraction technique. Selected samples have been submitted to controlled annealing to induce the amorphous‐to‐crystalline transformation. The influence of thermal treatments on the hysteresis properties has been studied as a function of thickness and microstructure on as prepared and annealed samples. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Quantifying magnetic anisotropy dispersion: Theoretical and experimental study of the magnetic properties of anisotropic FeCuNbSiB ferromagnetic films

“…Experimentally, several results have been obtained for FeCuNbSiB magnetic ribbons, and, consequently, the knowledgement about its magnetic properties and the crystallization process are well-established [1,2,[4][5][6]. However, although some reports found in literature have addressed distinct phenomena and aspects [7][8][9][10][11][12][13][14][15][16], the complete understanding on the magnetic behavior of amorphous FeCuNbSiB ferromagnetic films is still lacking [17].…”

FINEMET-type thin films deposited by HiPIMS: Influence of growth and annealing conditions on the magnetic behaviour

“…The pulse voltage was set to a constant value of −950 V, for a range of very short pulses varied in the range of 4-20 s. A standard planar circular magnetron cathode, equipped with a 56 mm diameter target made of multiple ribbons with the nominal composition Fe 73. 5 component parallel to the cathode surface was about 0.1 T. During the deposition process, the substrate was grounded and placed axially at 6 cm above and parallel to the cathode. The effective power, P eff , (the power which is effectively delivered to the plasma) was varied in the range of 30-90 W. The effective power can be calculated as [11]:…”

“…The deposition conditions of FeCuNbSiB thin films are of major interest in order to obtain materials with improved properties. Methods like direct current magnetron sputtering (DCMS), radio frequency magnetron sputtering (RFMS) or laser ablation can be successfully used for preparing amorphous thin films [5][6][7]. High power impulse magnetron sputtering (HiPIMS) is a relatively new technique used to grow high-quality amorphous thin films from a wide range of materials [8].…”

Nanomechanical characterization of amorphous and nanocrystalline FeCuNbSiB thin films

“…Nanocrystalline FeCuNbSiB alloys obtained by the partial crystallization of amorphous precursors with different geometries (wires, ribbons, powders or thin films) have attracted considerable attention related to their excellent soft magnetic properties (e.g. low coercive magnetic field, high saturation magnetization and permeability, and near-to-zero magnetostriction) [4][5][6][7][8]. This behavior is a consequence of their particular structure which consists of nanoscale ferromagnetic b.c.c.…”