Effect of Cu doping on the secondary electron yield of carbon films on Ag-plated aluminum alloy

Abstract

Reducing the secondary electron yield (SEY) of Ag-plated aluminum alloy is important for high-power microwave components. In this work, Cu doped carbon films are prepared and the secondary electron emission characteristics are studied systematically. The secondary electron coefficient δ max of carbon films increases with the Cu contents increasing at first, and then decreases to 1.53 at a high doping ratio of 0.645. From the viewpoint of surface structure, the higher the content of Cu is, the rougher the surface is, since more cluster particles appear on the surface due to the small solid solubility of Cu in the amorphous carbon network. However, from viewpoint of the electronic structure, the reduction of the sp2 hybrid bonds will increase the SEY effect as the content of Cu increases, due to the decreasing probability of collision with free electrons. Thus, the two mechanisms would compete and coexist to affect the SEY characteristics in Cu doped carbon films.

Полученные плазменно-химическим осаждением a-C : ND покрытия: взаимосвязь эмиссионных свойств и фазового состава

“…Электронная эмиссия углеродных материалов активно изучается в настоящее время [1][2][3][4][5]. При этом развитие практических приложений наноструктурированного углерода связывают с исследованием как полевой [1][2][3], так и вторичной электронной эмиссии [4,5].…”

“…Электронная эмиссия углеродных материалов активно изучается в настоящее время [1][2][3][4][5]. При этом развитие практических приложений наноструктурированного углерода связывают с исследованием как полевой [1][2][3], так и вторичной электронной эмиссии [4,5]. Метод химического осаждения из газовой фазы (chemical vapor deposition, CVD) часто применяется для синтеза материалов на основе углерода, характеризующихся в зависимости от структуры как низкой [6], так и высокой [7] вторичной электронной эмиссией, а также для формирования высокоэффективных термоэлектронных [8] и полевых эмиттеров [9].…”

a-C : ND coatings obtained by plasma chemical deposition: interplay between field emission properties and phase composition

“…Electron emission of carbon materials is being extensively studied nowadays [1][2][3][4][5]. In doing this, the development of practical applications of the nanostructured carbon is connected with the investigation of both the field electron emission [1][2][3] and the secondary electron emission [4,5].…”

“…Electron emission of carbon materials is being extensively studied nowadays [1][2][3][4][5]. In doing this, the development of practical applications of the nanostructured carbon is connected with the investigation of both the field electron emission [1][2][3] and the secondary electron emission [4,5]. The method of chemical vapor deposition (CVD) is often used to synthesize carbon-based materials that are characterized by dependence on the structure of both low secondary electron emission [6] and high [7] secondary electron emission, as well as to form high-performance thermo-electron emitters [8] and field emitters [9].…”