Effect of DC bias voltage on the deposition rate for Ni thin films by RF–DC coupled unbalanced-magnetron sputtering

Li-doped ZnO Piezoelectric Sensor for Touchscreen Applications

“…In other words, the films have a hexagonal structure and good crystallinity. The intensity of the peak increases as the bias voltage is increased to 20 V. However, impurity phases (i.e., (110) and (101)-oriented peaks) are observed in the sample synthesized using a higher bias voltage of 25 V. The formation of these phases can be attributed to a strong static electricity effect in the presence of a high DC-bias, which is consistent with that reported for the variation of crystalline structure of the Ni films in [12]. [13].…”

Annealing Ni nanocrystalline on WC–Co

“…Therefore, this peak is used for the stress analysis. Such preferential orientation along the (1 1 1) planes of Ni thin films sputter-deposited was already been reported by other authors [8,10,11] and possibly responsible for a higher wear resistance than the bulk Ni [11]. A strong shift towards lower diffraction angle was observed for 2Â scans performed for increasing .…”

“…Sputtering is the deposition technique selected here for Ni coating deposition. Sputter-deposited Ni coatings are largely used for electrical and optical applications [8,9], or as protective layers to improve corrosion resistance, wear resistance and hardness of different materials [10,11]. In high melting point materials, such as Ni deposited by sputtering, the accumulated intrinsic stresses tend to dominate over thermal stresses, according to the Thornton and Hoffman's criterion [12].…”

Surface coating with various metals on spherical polymer particles by using barrel sputtering technique

“…The metal-polymer composites thus prepared are denoted as M(x), where M and x denote the sputtered transition metal and the diameter of the polymer particles in m, respectively. For a Ni coating (Ni(15)), the modification was performed at 200 W for a rather long duration (8 h) because the magnetic property of the Ni target often reduced the sputtering efficiency [23]. The definition of the metal-coated samples and their preparation conditions are summarized in Table 1.…”