Effect of deposition rate on the structural, optical and electrical properties of Zinc oxide (ZnO) thin films prepared by spray pyrolysis technique

Enhancement of Photocatalytic Activity for Nanostructured ZnO Thin Film Prepared by Pulsed Spray Pyrolysis

“…where, c is the lattice constant of ZnO thin films and c 0 the lattice constant of bulk standard (c 0 = 0.5206 nm) [43]. The calculated mean strain is found to be very small even with the increase in the crystallite size.…”

“…ZnO and other oxides materials such as MoO 3 , WO 3 , and VO 3 nano structured thin films and powders have been prepared by a wide variety of techniques, such as, pulsed (ablation) laser deposition (PLD or ALD) [35,36], molecular beam epitaxy (MBE) [37], sputtering technique [38], electrochemical deposition [39], reactive evaporation [40], chemical vapor deposition (CVD) [41], sol-gel [42], and spray pyrolysis [43][44][45][46][47][48][49]. Among the preceding preparation techniques, spray pyrolysis is considered the most simple, large film scale, non-vacuum and inexpensive method [50,51].…”

Effect of fluorine (an anionic dopant) on transparent conducting properties of Sb (a cationic) doped ZnO thin films deposited using a simplified spray technique

“…plasma, photo, electro, etc.,) which otherwise is essential to induce chemical reaction used in most of the chemical vapour deposition processes. In this technique, it is also possible to modify the mechanical, electrical and optical properties of ZnO nanostructures by appropriately changing the process parameters [19,20,21].…”

Effect of Annealing Temperature on the Physical Properties of the ZnO Thin Films Deposited by Ultrasonic Spray Pyrolysis

“…From all the oxide materials studied, in the last years, the ZnO has emerged as one of the most promising materials, due to its optical and electrical properties, high chemical and mechanical stability, together with its abundance in nature, which makes it a lower cost material when compared to the most currently used transparent conductive oxide materials. ZnO thin films have been prepared using various methods such as molecular beam epitaxy (MBE) [6], chemical vapor deposition [7], electrochemical deposition [8], pulsed laser deposition (PLD) [9], sol-gel process [10], reactive evaporation [11], magnetron sputtering [12] and spray pyrolysis [13][14][15][16]. Spray pyrolysis technique is preferred among these techniques because it is cheaper, simpler and more versatile than the others, which allow the possibility of obtaining films with the required properties for different applications and also when large area deposition of the films are needed.…”