Effect of discharge power and silicon content on optical and mechanical properties of carbon-rich amorphous silicon carbide films obtained by PECVD

Lukianov, Anatolii; Klyui, N.I.; Sha, Bo; Lozinskii, V. B.; Temchenko, Volodymyr P.; Avksentyeva, Liubov V.; Staschuk, Vasyl S.

doi:10.1016/j.jallcom.2019.06.093

Cited by 8 publications

(2 citation statements)

References 31 publications

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“…However, this certain method often results in uncontrolled contamination, for example, by oxygen from water vapors easily absorbed on PECVD chamber walls, present in residues of atmosphere after sample loading, and especially in precursor gases due to insufficient cleanness. Particularly, such effect was mentioned in [ 76 ] where nonstoichiometric a-SiC films were studied, and even high-purity precursors did not allow to obtain films without oxygen. Such (and other) contamination can reach several at.…”

Section: Chemical Vapor Synthesis Of Sic Films: From Cvd To Aldmentioning

confidence: 99%

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

Fraga

Pessoa

2020

Micromachines

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A search of the recent literature reveals that there is a continuous growth of scientific publications on the development of chemical vapor deposition (CVD) processes for silicon carbide (SiC) films and their promising applications in micro- and nanoelectromechanical systems (MEMS/NEMS) devices. In recent years, considerable effort has been devoted to deposit high-quality SiC films on large areas enabling the low-cost fabrication methods of MEMS/NEMS sensors. The relatively high temperatures involved in CVD SiC growth are a drawback and studies have been made to develop low-temperature CVD processes. In this respect, atomic layer deposition (ALD), a modified CVD process promising for nanotechnology fabrication techniques, has attracted attention due to the deposition of thin films at low temperatures and additional benefits, such as excellent uniformity, conformability, good reproducibility, large area, and batch capability. This review article focuses on the recent advances in the strategies for the CVD of SiC films, with a special emphasis on low-temperature processes, as well as ALD. In addition, we summarize the applications of CVD SiC films in MEMS/NEMS devices and prospects for advancement of the CVD SiC technology.

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Section: Chemical Vapor Synthesis Of Sic Films: From Cvd To Aldmentioning

confidence: 99%

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

Fraga

Pessoa

2020

Micromachines

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“…In fact, the broader-band antireflection has always been the important, significant, and eventual pursuit in the field of antireflection. In many applications, such as architectural glass, car windshield, solar cell, cameras, optical components, liquid-crystal displays, , etc., broad-band antireflection films (ARFs) play a more and more crucial role of enhancing the efficiency of important optical parts. Eliminating unexpected reflection from contacted interfaces in these fields could save energy, reduce the occurrence of hazards, and get better visual effects.…”

Section: Introductionmentioning

confidence: 99%

Broader-Band and Flexible Antireflective Films with the Window-like Structures Inspired by the Backside of Butterfly Wing Scales

Ding

Liu

et al. 2021

ACS Appl. Mater. Interfaces

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Antireflective performance is critical for most optical devices, such as the efficient solar energy utilization in photovoltaic cells of an aerospace craft and optical displays of scientific precise equipment. Therein, outstanding broad-band antireflection is one of the most crucial properties for antireflection films (ARFs). Unfortunately, it is still a challenging work to realize perfect “broader-band” antireflection because both the low refractive indices materials and time-consuming nanotexturing technologies are required in the fabricating process. Even in this case, a broader-band and flexible ARF with hierarchical structures is successfully developed, which is inspired by butterfly wing scales. First, the butterfly wings surface is treated with acid and stuck on a clean glass. Now, all the scales on the wings will form a strong adhesion with the glass substrate. Then, the wings are removed and the scales are left on the glass slide. Now the backside of scales is facing outward, the backside structures of the scales are coincidentally used as the template. Finally, the structure is replicated and the ARF with a controllable thickness is successfully fabricated by rotating PDMS on the biological template. In this work, the bionic ARFs realize the transmission of nearly 90% and more than 90% in the visible light and infrared region. It enhanced transmission to 13% under standard illumination compared with flat PDMS films of the same thickness. Furthermore, the ARF is flexible enough that it could bend nearly 180° to meet the special antireflection requirements in some extreme conditions. It is expected that this bioinspired AR film could revolutionize the technologies of broader-band antireflective materials and impact numerous applications from glass displays to optoelectronic devices.

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Effect of Discharge Properties of the Oxide High Barrier Film Deposited by Roll-to-Roll MF-PECVD

Dong

Feng

Wang

et al. 2023

Springer Proceedings in Physics

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Effect of discharge power and silicon content on optical and mechanical properties of carbon-rich amorphous silicon carbide films obtained by PECVD

Cited by 8 publications

References 31 publications

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

Broader-Band and Flexible Antireflective Films with the Window-like Structures Inspired by the Backside of Butterfly Wing Scales

Effect of Discharge Properties of the Oxide High Barrier Film Deposited by Roll-to-Roll MF-PECVD

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