2014
DOI: 10.5772/58317
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Effect of Dopants on Epitaxial Growth of Silicon Nanowires

Abstract: We investigated the effects of dopants on epitaxial growth of Si NWs, with an emphasis on synthesizing vertical epitaxial Si NW arrays on Si (111) substrates. We found that addition of boron with a B:Si feed-in atomic ratio greater than 1:1000 improved the percentage of Si NWs grown along the vertical <111> direction to more than 90%, compared to 38% for i-Si NWs. We also demonstrated a stemmed growth strategy and achieved a 93% percentage of i-Si NW segments along the vertical <111> direction on S… Show more

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Cited by 3 publications
(3 citation statements)
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“…The sheet resistance of composite film was slightly increased (<5.3%) during 200 cycles of tensile and compression folding. Stubhan et al 49 fabricated AgNW/buffer layer electrode with a photoactive layer of poly(3hexylthiophene) (P3HT) and [6,6]-phenyl-C61 butyric acid methyl ester (PCBM). The material was proposed as a replacement of commonly used ITO electrode material.…”
Section: Nanocomposites Filled With Polymeric Nanowiresmentioning
confidence: 99%
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“…The sheet resistance of composite film was slightly increased (<5.3%) during 200 cycles of tensile and compression folding. Stubhan et al 49 fabricated AgNW/buffer layer electrode with a photoactive layer of poly(3hexylthiophene) (P3HT) and [6,6]-phenyl-C61 butyric acid methyl ester (PCBM). The material was proposed as a replacement of commonly used ITO electrode material.…”
Section: Nanocomposites Filled With Polymeric Nanowiresmentioning
confidence: 99%
“…Note that PLEDs with higher than 100% efficiency are demanded for future LED device applications. Voc: open-circuit voltage; Jsc: short-circuit current density; FF: fill factor; PCE: power conversion efficiency; PCDTBT: poly(N-9-hepta-decanyl-2,7-carbazole)-alt-5,5-(4,7-di-2-thienyl-2,1,3-benzothiadiazole); PC71BM: [6,6]-phenyl C71 butyric acid methyl ester; rGO: reduced graphene oxide; AgNW: silver nanowire; ITO: indium tin oxide.…”
Section: Light Emitting Diodesmentioning
confidence: 99%
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