2020 IEEE Calcutta Conference (CALCON) 2020
DOI: 10.1109/calcon49167.2020.9106535
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Effect of Doped AlGaN Width Variation on Analog Performance of Dual Gate Underlap MOS-HEMT

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“…The AlN spacer between the AlGaN and GaN layer is known to increase the ns, but its physical root cause is not clearly identified [1,2]. In addition, the effect of n-doped AlGaN on the ns is investigated [3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%
“…The AlN spacer between the AlGaN and GaN layer is known to increase the ns, but its physical root cause is not clearly identified [1,2]. In addition, the effect of n-doped AlGaN on the ns is investigated [3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%