2007
DOI: 10.1007/s10854-007-9256-y
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Effect of doping on properties of Zno:Cu and Zno:Ag thin films

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Cited by 18 publications
(13 citation statements)
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“…It has a high absorption coefficient in the visible range of the optical spectrum and enhanced electrical properties. 5 ZnS thin lms can be fabricated by molecular beam epitaxy (MBE), 6 sputtering, 7 metal organic vapor chemical deposition (MOCVD), 8,9 different wet chemical synthesis methods [10][11][12][13][14] and spray pyrolysis. The last technique is one of the simplest and efficient methods for fabrication of large area lms and it offers an easy way to incorporate any dopant by adding it to the starting spray solution.…”
Section: Introductionmentioning
confidence: 99%
“…It has a high absorption coefficient in the visible range of the optical spectrum and enhanced electrical properties. 5 ZnS thin lms can be fabricated by molecular beam epitaxy (MBE), 6 sputtering, 7 metal organic vapor chemical deposition (MOCVD), 8,9 different wet chemical synthesis methods [10][11][12][13][14] and spray pyrolysis. The last technique is one of the simplest and efficient methods for fabrication of large area lms and it offers an easy way to incorporate any dopant by adding it to the starting spray solution.…”
Section: Introductionmentioning
confidence: 99%
“…The Cu can interact with intrinsic defects of ZnO resulting in formation of different defect complex which effect optical transitions in ZnO. It was found that this allows changing of the emission color from green to white [10]. Cu-doped ZnO has shown an essential improvement on electrical, optical, magnetic and luminescence performance [11].…”
Section: Introductionmentioning
confidence: 99%
“…In the last few years, ZnO has emerged as one of the most promising materials due to its optical and electrical properties, high mechanical and chemical stability, together with its abundance in nature and nontoxicity. In order to improve the properties of ZnO films, several techniques such as sputtering [6][7][8][9][10], thermal evaporation [11], metal-organic chemical vapour deposition [12,13], spray pyrolysis [14] and pulsed laser deposition [15][16][17] have been applied for their production. Radio-frequency (RF) magnetron sputtering technique is one of preferred among these techniques since it is versatile and permits to produce the high-quality films for different applications.…”
Section: Introductionmentioning
confidence: 99%
“…The structural, physical and electrical properties of ZnO films were governed by deposition parameters [14], posttreatment [7,17,18] and doping material [6,15,12,[19][20][21][22] such as Al, Ga, Sc, Y, Mn, Cu, Ag, etc. In addition, it is known that the metals of group I (Ag and Cu) are fast-diffusing impurities in the semiconductor compound [14].…”
Section: Introductionmentioning
confidence: 99%