2018
DOI: 10.1016/j.apsusc.2018.04.228
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Effect of etching time on structure of p-type porous silicon

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Cited by 19 publications
(6 citation statements)
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“…Namely it is related to the SiOxHy compounds covering the structure's surface. The presence of the SiOxHy has been confirmed in the works [5,12] using FTIR spectrometry of the samples of this type in wavenumber range 790-1250 cm -1 (0.098 -0.155 eV).…”
Section: Resultsmentioning
confidence: 73%
See 1 more Smart Citation
“…Namely it is related to the SiOxHy compounds covering the structure's surface. The presence of the SiOxHy has been confirmed in the works [5,12] using FTIR spectrometry of the samples of this type in wavenumber range 790-1250 cm -1 (0.098 -0.155 eV).…”
Section: Resultsmentioning
confidence: 73%
“…The model, in which the maximum of PL localized at 640 nm is related to defective levels os SiHx and SiOy components, is greatly accepted. The presence of groups SiOxHy, observed using FTIR spectroscopy in IR region, was reported in the work [5]. Only small influence of PL on surface morphology was found.…”
Section: Introductionmentioning
confidence: 54%
“…The value of R was decreased, and RMS roughness was increased with the increase in etching time, indicating an increasing porosity of PSi. In turn, it caused an increase in the optical band gap energy and thickness of PSi, enabling the most extended channels for the light path length within the PSi layer [51].…”
Section: Structure and Morphology Of Znpsi And Znsiqdsmentioning
confidence: 99%
“…These reactions are affected by the type of conductivity, wafer res istivity, current density, type of dopant, and solution composition. [11].…”
Section: Introductionmentioning
confidence: 99%