2012
DOI: 10.1016/j.jcrysgro.2012.08.009
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Effect of growth temperature on surface morphology and structure of InAs/GaSb superlattices grown by metalorganic chemical vapor deposition

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Cited by 7 publications
(6 citation statements)
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“…Nedelcu's group [154] proposed a complex scheme with a smooth InAs → InAsSb → InGaSb → GaSb → InGaSb → InAsSb → InAs structure achieving optimal morphology and low strain. In addition, Li et al [160,161] selected As 0.1 Sb 0.9 interfaces over InAsSb as an option to compensate the strain of the SLs on the GaSb substrate, which achieved a smooth surface with an root mean square (RMS) roughness of 0.7 nm and strong absorption coefficient in the MWIR region. Arikata et al [162] demonstrated LWIR T2SLs by applying simple InSb interface layers grown at 500 • C, which addressed the in-plane unbalanced strain, obtaining defect-free 200-period SLs with an intense PL peak at 6.1 µm and an external QE of 31% at 3.5 µm.…”
Section: Growth Of Inas/gasb T2slsmentioning
confidence: 99%
“…Nedelcu's group [154] proposed a complex scheme with a smooth InAs → InAsSb → InGaSb → GaSb → InGaSb → InAsSb → InAs structure achieving optimal morphology and low strain. In addition, Li et al [160,161] selected As 0.1 Sb 0.9 interfaces over InAsSb as an option to compensate the strain of the SLs on the GaSb substrate, which achieved a smooth surface with an root mean square (RMS) roughness of 0.7 nm and strong absorption coefficient in the MWIR region. Arikata et al [162] demonstrated LWIR T2SLs by applying simple InSb interface layers grown at 500 • C, which addressed the in-plane unbalanced strain, obtaining defect-free 200-period SLs with an intense PL peak at 6.1 µm and an external QE of 31% at 3.5 µm.…”
Section: Growth Of Inas/gasb T2slsmentioning
confidence: 99%
“…Moreover, it has been shown that the MOCVD growth of short periods InAs/GaSb and InAs/InAsSb T2SL structures is further limited by the possibility of decomposition and degradation of the interface quality during growth. [ 131–135 ] Consequently, Huang et al [ 136–139 ] have alternatively demonstrated the first MOCVD growth of Al‐free InAs/GaSb T2SL PNn barrier structure, which was comprised of a p ‐type mid‐wavelength superlattice (MWSL) contact layer ( P ‐region) and an n ‐type MWSL barrier layer ( N ‐region) and an n ‐type long‐wavelength superlattice (LWSL) absorber layer ( n ‐region), which resulted in high‐quality material growth and high‐performance T2SL detectors. For more details about the difficulties associated with the MOCVD growth of Sb‐based and other III–V semiconductors, the reader is directed to the review work published by Biefeld.…”
Section: Fundamental Materials Properties Of the Type‐ii Superlatticementioning
confidence: 99%
“…The growth of the superlattice takes place under different thermal conditions (below 400 °C [ 12 ]) than those needed for optimal growth of the constituent layers (~430 °C for InAs [ 13 ], ~520 °C for GaSb [ 14 ]). As a result, the formation of many types of defects (stacking faults, vacancies, interstitial substitutional, and others) can occur [ 15 ]. On the other hand, the strain energy is accumulated in InAs/GaSb structure due to the lattice mismatch between interfaces and GaSb substrate.…”
Section: Introductionmentioning
confidence: 99%