2017
DOI: 10.1063/1.4980705
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Effect of heater design on the melt crystal interface

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Cited by 5 publications
(3 citation statements)
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“…The uniform thermal stress is maintained in the grown mc-Si ingot for the modified HEB. [21,22] The thermal stress may be reduced due to the thermal gradient influenced by the modified HEB.…”
Section: Von Mises Stressmentioning
confidence: 99%
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“…The uniform thermal stress is maintained in the grown mc-Si ingot for the modified HEB. [21,22] The thermal stress may be reduced due to the thermal gradient influenced by the modified HEB.…”
Section: Von Mises Stressmentioning
confidence: 99%
“…The annealing process affects the dislocation density of the grown mc-Si ingot. [22,25] In Figure 5, the conventional ingot has a minimum dislocation density compared to the modified furnace. But, the 100% grown ingot has a maximum dislocation density due to heterogeneous thermal stress.…”
Section: Dislocation Densitymentioning
confidence: 99%
“…The composition of Si 3 N 4 and silica crucible impacts the chemical reaction in the DS process. [46,[61][62][63] The higher oxygen concentration is obtained from the roughed inner side of the silica crucible. There are different silica crucibles and they have specific barriers, then implemented to grow the mc-Si ingot.…”
Section: Ds Furnacementioning
confidence: 99%