2018
DOI: 10.22214/ijraset.2018.3733
|View full text |Cite
|
Sign up to set email alerts
|

Effect of In2O3 Dopant on the Properties of V2O5 Thin Films Prepared by Vacuum Deposition on ITO Substrates

Abstract: I. INTRODUCTIONThe ambition of the present investigation is the search for new phases showing properties of intellectual and eventual practical interest. Among the various metal oxides the promising candidate, which possesses an interesting catalytic properties of divalent metal vanadates (V) [1,2], including cobalt (II) vanadates (V) [3,4] have been recognized for many years. The variety of vanadium oxidation states ranging from 2+to5+, wide band gap, good thermal, chemical stability and also the unevenness o… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 19 publications
0
0
0
Order By: Relevance