2004
DOI: 10.1002/pssc.200405272
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Effect of intermediate layer on resonance phonon transport

Abstract: Multi-channel mechanism of resonance phonon transport through a Si-Cu point contact is studied. It is shown that the peaks of the reduced heat flux in the temperature range 4 K < T < 9.3 K are caused by resonance phonon transfer through different layers of impurity atoms present in a point contact.

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