2018
DOI: 10.1149/2.1001807jes
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Effect of Joule Heating on Formation of Porous Structure of Thin Oxalic Acid Anodic Alumina Films

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Cited by 18 publications
(13 citation statements)
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“…3B), which agrees with D inter for anodizing in 0.3 M oxalic acid. 37 If we apply the equation, D inter = 2.41U a + 3.5, we get 196.3 nm. However, these cells are packed less tightly than oxalic acid films.…”
Section: Resultsmentioning
confidence: 99%
“…3B), which agrees with D inter for anodizing in 0.3 M oxalic acid. 37 If we apply the equation, D inter = 2.41U a + 3.5, we get 196.3 nm. However, these cells are packed less tightly than oxalic acid films.…”
Section: Resultsmentioning
confidence: 99%
“…From the substrates, square samples with an area of no more than 7.2 cm 2 were cut and anodized in a 0.3 M aqueous solution of oxalic acid at constant U a = 30 V and T e = 5 °С-40 °С until the complete oxidation of aluminum. The anodizing process was carried out in a two-electrode fluoroplastic cell similar to that described by Chernyakova et al 22 and was controlled by a direct current power supply GW Instek (GPR-30H100). A Viton O-ring set out the anodizing area of ca.…”
Section: Methodsmentioning
confidence: 99%
“…According to Chernyakova et al, 22 to provide a more uniform temperature distribution over the surface of the working electrode at different anodizing modes and correspondingly greater pore ordering, we chose a SiO 2 /Si substrate because of its higher thermal conductivity (149 W m −1 K −1 ) close to that of aluminum (200 W m −1 K −1 ). The anodizing voltage was also selected according to Chernyakova et al 22 as, during the oxidation of aluminum thin films in oxalic acid, U a of 30 V is a turning point at which the mechanism of the formation of porous anodic structure is changed.…”
Section: Methodsmentioning
confidence: 99%
“…The first successful demonstration of this principle was reported for the similar anodic aluminum oxide (AAO) system to grow ordered structures at rates approaching 10 4 nm min −1 [15,16] . These “hard anodization” processes, however, are accompanied by intense temperature surges due to Joule heating [17,18] . Left unaddressed, localized high current regions in the oxide film generate drastic temperature gradients, current channeling, and film breakdown – known as oxide burning [19–22] .…”
Section: Introductionmentioning
confidence: 99%
“…[15,16] These "hard anodization" processes, however, are accompanied by intense temperature surges due to Joule heating. [17,18] Left unaddressed, localized high current regions in the oxide film generate drastic temperature gradients, current channeling, and film breakdown -known as oxide burning. [19][20][21][22] To overcome this, pulse anodization techniques, in which the induced current density oscillates between "mild" and hard conditions (e. g., ~3 and 370 mA cm À 2 , respectively) were developed to permit intermittent heat dissipation.…”
Section: Introductionmentioning
confidence: 99%