“…Researchers from all over the world have reported a range of approaches in the literature for depositing ZnO thin films by manipulating key parameters and employing diverse methodologies. Multiple techniques including physical vapor deposition, chemical vapor deposition, chemical solution deposition, molecular beam epitaxy [20][21][22][23], sputtering [24], spray pyrolysis [25][26][27], electrodeposition [28,29], and sol-gel technique [30][31][32][33] have been used to fabricate thin films. Compared to other approaches, pulsed laser deposition (PLD) has various benefits, including the ability to create high-quality thin films at low temperatures, ease and low cost of manufacturing multi-layers compared to other processes, and the ability to fabricate uniform thin films.…”