Effect of nano silicon dioxide on the structure and properties of FeCl₃‐doped polyvinyl alcohol photopolymer film

Abstract

The polyvinyl alcohol (PVA) photopolymer films (PFs) were prepared based on iron(III) trichloride as the photosensitizer and PVA as the polymer matrix (Fe(III)-PVA). The nano silicon dioxide (nano-SiO 2 ) was mixed with the resin in proportions of 0.5, 1.0, 2.0, and 5.0 wt %, respectively. The iodine gallium lamp (350-450 nm) was used as a UV curing light source. The effects of nano-SiO 2 on the structures and properties of Fe(III)-PVA PFs were studied by scanning electron microscopy(SEM) analysis, ultraviolet-visible absorption spectroscopy (UV/Vis), X-ray diffraction (XRD), dynamic thermomechanical analysis(DMA), gel content test, tensile strength test, and Shore hardness test. The Fe(III)-PVA PFs with the content of 1.0 wt %-nano-SiO 2 exhibits the highest gel content and tensile strength. The Fe(III)-PVA PFs with the content of 2.0 wt % nano-SiO 2 exhibits the highest Shore hardness. Photolithographic patterning of the Fe(III)-PVA PFs using a UV source has been carried out, which leads to a good contrast behavior after development in an aqueous media when the content of nano-SiO 2 was lower than 2.0 wt %. After evaluating the structure, performance, and development results, the Fe(III)-PVA PFs with the content of 1.0 wt % nano-SiO 2 exhibits the best overall properties.