2012
DOI: 10.1016/j.mssp.2012.04.007
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Effect of NaOH solution on surface textured ZnO: Al films prepared by pulsed direct current magnetron sputtering

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Cited by 8 publications
(3 citation statements)
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“…They are also among the most important transparent conductive oxide (TCO) materials [9]. ZnO thin films have been deposited by such different methods as sputtering techniques [10][11][12], metal oxide chemical vapor deposition (MOCVD) [13], molecular beam epitaxy (MBE) [14], pulsed laser deposition [15], sol-gel processing [16,17], and spray pyrolysis [18]. Among these methods, the spray pyrolysis method has attracted the especially great attention among researchers due to its simpler mechanism, low setup costs, and ability to spray large areas [19].…”
Section: Introductionmentioning
confidence: 99%
“…They are also among the most important transparent conductive oxide (TCO) materials [9]. ZnO thin films have been deposited by such different methods as sputtering techniques [10][11][12], metal oxide chemical vapor deposition (MOCVD) [13], molecular beam epitaxy (MBE) [14], pulsed laser deposition [15], sol-gel processing [16,17], and spray pyrolysis [18]. Among these methods, the spray pyrolysis method has attracted the especially great attention among researchers due to its simpler mechanism, low setup costs, and ability to spray large areas [19].…”
Section: Introductionmentioning
confidence: 99%
“…However, the etching process and surface morphology are difficult to control because of the high etching rate of HCl solution. In our previous research work [14], in order to control the etching process and the surface morphology effectively, NaOH solution was employed to etch the AZO films, and the typical crater-like textured structures of AZO films were obtained successfully. It is acknowledged that the optimum surface textured structure strongly depends on the deposition conditions.…”
Section: Introductionmentioning
confidence: 99%
“…The last one exhibits the advantage of improving the scattering ability without sacrificing the optoelectronic properties [21]. Recently, post treatment by chemical wet-etching has been reported to fabricate texture surface, such as the utilization of HCl [22,23], HF [24], NaOH [25]and NH 4 Cl [26,27].However, the etching rate is too fast to control for the sake of the easy etch-ability of AZO films [28]. Up to now, many attempts have been undertaken with a controllable etching rate, such as a two-step etching process by high and low concentration alternately [21] or the combined utilization of the two kinds of acid [29].…”
Section: Introductionmentioning
confidence: 99%