Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition

Cheng, Hsin‐Ming; Chen, Yuru; Wu, Wen-Tuan; Hsu, Ching-Ming

doi:10.1016/j.mseb.2011.02.001

Cited by 25 publications

(15 citation statements)

References 11 publications

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“…Moreover, Zhang et al demonstrated a deposition route based on H2-N2 plasma and Ti(NMe2)3(CpMe) [804]. The GPC values fall in the range typically reported for undoped TiO2 films, with a trend of decreasing GPC with increasing N content [65,128].…”

Section: N Dopingmentioning

confidence: 96%

Titanium dioxide thin films by atomic layer deposition: a review

Niemelä

Marín

Karppinen

2017

Semicond. Sci. Technol.

145

116

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Within its rich phase diagram titanium dioxide is a truly multifunctional material with a property palette that has been shown to span from dielectric to transparent-conducting characteristics, in addition to the well-known catalytic properties. At the same time down-scaling of microelectronic devices has led to an explosive growth in research on atomic layer deposition (ALD) of a wide variety of frontier thin-film materials, among which TiO2 is one of the most popular ones. In this topical review we summarize the advances in research of ALD of titanium dioxide starting from the chemistries of the over 50 different deposition routes developed for TiO2 and the resultant structural characteristics of the films. We then continue with the doped ALD-TiO2 thin films from the perspective of dielectric, transparent-conductor and photocatalytic applications. Moreover, in order to cov er the lat est tr ends in t he research f ield, both the var iously constr ucted TiO2 nanostructures enabled by ALD and the Ti-based hybrid inorganic-organic films grown by the emerging ALD/MLD (combined atomic/molecular layer deposition) technique are discussed.

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Section: N Dopingmentioning

confidence: 96%

Titanium dioxide thin films by atomic layer deposition: a review

Niemelä

Marín

Karppinen

2017

Semicond. Sci. Technol.

145

116

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“…Generally speaking, there are two kinds of processes to prepare N-doped TiO 2 . One process can be ascribed as one-step direct incorporation of N atoms into TiO 2 lattice, such as sol-gel method [74][75][76], chemical vapor deposition (CVD) [77,78], atomic layer deposition (ALD) [79][80][81], hydrothermal method [82][83][84], solvothermal method [85][86][87][88], sol-hydrothermal process [89], hydrolysis-precipitation process [90], bioprocess-inspired method [91], electrochemical method [92][93][94], ion implantation [95,96], combustion method [97][98][99], mechanochemical method [100,101], low-temperature direct nitridization method [102], and microwave-assisted method [103]. [102].…”

Section: Preparationmentioning

confidence: 99%

Influences of Doping on Photocatalytic Properties of TiO2 Photocatalyst

Huang¹,

Yan²,

Zhao³

2016

Semiconductor Photocatalysis - Materials, Mechanisms and Applications

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As a kind of highly effective, low-cost, and stable photocatalysts, TiO 2 has received substantial public and scientific attention. However, it can only be activated under ultraviolet light irradiation due to its wide bandgap, high recombination, and weak separation efficiency of carriers. Doping is an effective method to extend the light absorption to the visible light region. In this chapter, we will address the importance of doping, different doping modes, preparation method, and photocatalytic mechanism in TiO 2 photocatalysts. Thereafter, we will concentrate on Ti 3+ self-doping, nonmetal doping, metal doping, and codoping. Examples of progress can be given for each one of these four doping modes. The influencing factors of preparation method and doping modes on photocatalytic performance (spectrum response, carrier transport, interfacial electron transfer reaction, surface active sites, etc.) are summed up. The main objective is to study the photocatalytic processes, to elucidate the mechanistic models for a better understanding the photocatalytic reactions, and to find a method of enhancing photocatalytic activities.

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“…Thus, at +0.6 V versus Ag/AgCl/0.1 m KCl, both impedance spectra and transient photocurrent were registered for TiO 2 /Fe 3 O 4 before and after its thermal annealing and are shown in Figure e,f, respectively. The results clearly show that Fe 3 O 4 /FTO samples do not show any special photoelectrochemical advantage; on the other hand, TiO 2 /Fe 3 O 4 /FTO shows an improvement over the TiO 2 /FTO control samples, which has been partially addressed by other studies and is attributed to the different electron transfer media . More interestingly, the annealed nanoparticles (TiO 2 /Fe 3 O 4 /FTO sample) clearly shows a high increment over the untreated sample, with an increment of almost ≈90% after N 2 adsorption, which in view of the UV–vis spectra (Figure S4, Supporting Information) clearly shows the influence of N 2 on the TiO 2 layer.…”

Section: Resultsmentioning

confidence: 72%

“…Nitrogen incorporation on the NPs was further confirmed by X‐ray photoelectron spectroscopy (XPS) measurements performed on as‐deposited (not annealed) and postannealed Fe 3 O 4 /FTO samples. Results are shown in Figure a, focusing on the region between 380 and 415 eV, where a peak around 400 eV, corresponding to the N 1s, clearly confirms the existence of molecularly absorbed nitrogen after the annealing process . The total nitrogen concentration was quantified as 1.2%, this value being slightly higher than the estimation by EELS measurements, but more reliable due to the larger area investigated in the XPS method (Figure S3, Supporting Information).…”

Section: Resultsmentioning

confidence: 77%

Photoelectrochemically Active N‐Adsorbing Ultrathin TiO₂ Layers for Water‐Splitting Applications Prepared by Pyrolysis of Oleic Acid on Iron Oxide Nanoparticle Surfaces under Nitrogen Environment

Kertmen

Barbé

Szkoda

et al. 2018

Adv Materials Inter

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Highly performing photocatalytic surfaces are nowadays highly desirable in energy fields, mainly due to their applicability as photo water‐splitting electrodes. One of the current challenges in this field is the production of highly controllable and efficient photoactive surfaces on many substrates. Atomic layer deposition has allowed the deposition of photoactive TiO2 layers over wide range of materials and surfaces. However, nitrogen doping of the growing layers, a highly effective way of controlling the absorption edges of photoactive surfaced, is still a challenging task. Here, the preparation of hierarchical nanostructured surfaces based on Langmuir–Schaefer and atomic layer deposition is proposed. Ultrathin TiO2 layers that are photoelectrochemically active in water splitting are prepared by a relatively low‐temperature catalytic decomposition of oleic acid capping layers of iron oxide nanoparticles and the posterior nitrogen adsorption. The results evidence that simple N‐adsorption is sufficient to narrow the bandgap of TiO2 layers that is equal to bandgap narrowing (0.12 eV) observed for substitutionally N‐doped materials. The photocatalytic activity tests of the prepared surfaces in water‐splitting applications demonstrate ≈90% increase in the activity of the N‐adsorbing TiO2 layers.

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Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition

Cited by 25 publications

References 11 publications

Titanium dioxide thin films by atomic layer deposition: a review

Titanium dioxide thin films by atomic layer deposition: a review

Influences of Doping on Photocatalytic Properties of TiO2 Photocatalyst

Photoelectrochemically Active N‐Adsorbing Ultrathin TiO₂ Layers for Water‐Splitting Applications Prepared by Pyrolysis of Oleic Acid on Iron Oxide Nanoparticle Surfaces under Nitrogen Environment

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Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition

Cited by 25 publications

References 11 publications

Titanium dioxide thin films by atomic layer deposition: a review

Titanium dioxide thin films by atomic layer deposition: a review

Influences of Doping on Photocatalytic Properties of TiO2 Photocatalyst

Photoelectrochemically Active N‐Adsorbing Ultrathin TiO2 Layers for Water‐Splitting Applications Prepared by Pyrolysis of Oleic Acid on Iron Oxide Nanoparticle Surfaces under Nitrogen Environment

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Photoelectrochemically Active N‐Adsorbing Ultrathin TiO₂ Layers for Water‐Splitting Applications Prepared by Pyrolysis of Oleic Acid on Iron Oxide Nanoparticle Surfaces under Nitrogen Environment