Effect of Nitrogen Flow Rate on Structure and Adhesion Strength of Magnetron Sputtered Ti-Si-N Nanocomposite Films

Abstract

Abstract. Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N 2 gas atmosphere. The effect of N 2 flow rate on the structure, adhesion strength and friction coefficient of the deposited films was studied by using X-ray diffraction, atom force microscope, field emission scanning electron microscopy and multi-functional tester for material surface properties. The Ti-Si-N films had a fine, smooth and compact structure with TiN nanograins embedded in an amorphous Si 3 N 4 matrix. The nanocomposite films exhibited (200), (111), (220) and (222) reflections with a dominant orientation of the (200) reflection. When the N 2 flow rate increased, the film structure was refined. It was found that both interfacial adhesion strength and friction coefficient depended on the N 2 flow rate, and the best values were exhibited by the nanocomposite film produced at N 2 flow rate of 15 sccm, perhaps contributed to a finer and smoother structure of this deposited film.