Effect of Nitrogen Flow Ratio on Degradation Behaviors and Failure of Magnetron Sputter Deposited Tantalum Nitride

Li, Zhigang; Zhang, Yubao; Wang, Yi; Li, Jinfeng; Zhao, Honglin

doi:10.3390/coatings11091133

Cited by 6 publications

(2 citation statements)

References 14 publications

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“…An increasing nitrogen flow rate results in a decrease in the sputtering ability of argon ions, leading to a reduction in target power. As a result of decreased target power, plasma density decreases [19,20]. Consequently, plasma impedance rises, necessitating a higher cathode potential.…”

Section: Introductionmentioning

confidence: 99%

Influence of topography on nano-mechanical properties of cylindrical magnetron sputtered TiN films

Atta,

Mathew,

Dash

et al. 2024

Surf. Topogr.: Metrol. Prop.

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Numerous studies on Nano-mechanical behavior of the thin films explained primarily in terms of their film morphology and particle size rather than film topography. Therefore, the current study investigates the effect of film topography on the nano-mechanical characteristics of the film. Ti/TiN multilayer thin films were deposited at varying deposition pressures by using an indigenously developed Cylindrical Magnetron Sputtering (CMS) unit. Surface crystallographic information is characterized by synchrotron-based Grazing Incidence XRD analysis. Film growth follows self-assembled nano hill architecture as revealed by AFM and in-situ Scanning Probe Microscopy images. The tribo-mechanical properties of the film is dependent on the height and spacing of its self-assembled structure, which experiences either crushing or buckling under the indenter load, thereby affecting film characteristics. Film deposited at moderate pressure exhibits superior wear behavior, attributed to the interplay between Plasticity Index (PI) and Depth Recovery Ratio (DRR). The study primarily focused on film growth phenomena by using cylindrical targets and their influence on nanomechanical properties of the film.

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Section: Introductionmentioning

confidence: 99%

Influence of topography on nano-mechanical properties of cylindrical magnetron sputtered TiN films

Atta,

Mathew,

Dash

et al. 2024

Surf. Topogr.: Metrol. Prop.

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“…TaN films have been used as diffusion barriers and as thin-film resistors in the electronic industries because of their highly stable structures and properties [2][3][4]. In addition, it has been reported that TaN consistently shows excellent mechanical and chemical properties [5,6], such as high oxidation-and wear-resistance, as well as better-than-average toughness.…”

Section: Introductionmentioning

confidence: 99%

Structural and Mechanical Properties of Fluorine-Containing TaCxNy Thin Films Deposited by Reactive Magnetron Sputtering

Hsieh

et al. 2022

Coatings

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TaN thin-film coatings are well known for their good mechanical properties, acceptable toughness, as well as good biocompatibility. However, the friction coefficient of these films is sometimes too high, or the hemocompatibility is poor. The purpose of this study is to reduce the friction coefficient and increase the hydrophobicity of TaN coatings by introducing carbon and fluorine into the coatings. This study has never been conducted by other researchers. Fluorine-containing tantalum carbonitride (i.e., F–TaCxNy) top layers were deposited on TaN/Ta interlayers by reactive sputtering with fixed nitrogen and various hexafluoroethane (C2F6) mass flow rates. During the deposition process, C2F6 gas with various mass flow rates was added. After deposition, these F–TaCxNy multi-layered films were then characterized using XRD, XPS, FTIR, FESEM, WDS, a nano-indenter, a water contact-angle measurement system, and a tribometer. The tribological tests were carried out in the environment with and without humidity. The surface energies of the films were examined with water contact-angle variation. According to structural analysis, TaN phase would transform to TaCxNy with the increase in the C2F6 mass flow rate, which would result in a decrease in the friction coefficient and an increase in hydrophobicity. The films’ hardness (H, increased at most by 20%), elastic modulus (E), and H/E ratio first increased then decreased, most likely due to the increase in relatively soft C–F bonding. According to the results obtained from tribotesting, it was found that an increase in carbon and fluorine contents in the films reduces the friction by more than 30%, and wear rate by more than 50%. More importantly, the effects of moisture on the friction coefficient can be minimized to almost nothing. In a water contact-angle study, the contact angle increased from 60° to 85° with the increase in C2F6 mass flow rates. This evidence illustrated that hemocompatibility of the TaN thin film can be significantly enhanced through the formation of Ta–C and C–Fx bonding. The chemical composition and bonding status of these films, especially the existence of C–Fx bonds, were studied by FTIR and XPS. In sum, with the increased C2F6 mass flow rate, the carbon and fluorine contents in the films increased, while the nitrogen content decreased. The structure, bonding status, and compositions varied accordingly. The tribological behaviors were significantly improved. Furthermore, by carrying out tribotesting in humid air and a dry argon environment, it was confirmed that the greater the fluorine content, the less sensitive the films would be to environment change. This is attributable to the induced lower surface energy and reduced adsorption to water vapor due to the increase in C–Fx bonds. The successfully fabricated and studied F–TaCxNy films could be applied in many areas such as artificial blood vessels, or precision components in an atmospheric or vacuum environment.

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The Effects of the Addition of Zr on the Mechanical and Tribological Properties of TaN Coating

García,

Flores-Martínez,

Rivera

et al. 2023

J. of Materi Eng and Perform

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Effect of Nitrogen Flow Ratio on Degradation Behaviors and Failure of Magnetron Sputter Deposited Tantalum Nitride

Cited by 6 publications

References 14 publications

Influence of topography on nano-mechanical properties of cylindrical magnetron sputtered TiN films

Influence of topography on nano-mechanical properties of cylindrical magnetron sputtered TiN films

Structural and Mechanical Properties of Fluorine-Containing TaCxNy Thin Films Deposited by Reactive Magnetron Sputtering

The Effects of the Addition of Zr on the Mechanical and Tribological Properties of TaN Coating

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