Effect of O₂ increase on properties of vanadium oxide coatings

Abstract

is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. The present research was carried out with the aim of studying the influence of oxygen concentration during processing on the properties of the VO x coatings deposited by cathodic magnetron sputtering on a stainless steel AISI 316L substrate. Mechanical and tribological properties were measured by nanoindentation and sliding wear tests respectively. Adhesion was evaluated by means of the scratch test. In order to determine the texture of the coatings, complementary characterization methods including X-ray diffraction in grazing incidence and Bragg Brentano configurations, as well as V scans, were performed. It was found that the texture of the crystalline coatings is strongly influenced by the amount of partial pressure of oxygen in the reactor atmosphere. The V 2 O 5 phase, with an orthorhombic symmetry, was produced in the coating, which had a pronounced texturing for the (001) plane, exhibiting the best values of hardness and Young modulus. It was shown that, as the oxygen concentration drops to ,1 sccm, the mechanical and tribological characteristics, as well as the coating adhesion, tend to decrease considerably.

Improvement of anti-corrosive and anti-oxidative properties of electroless Ni-P coating

“…The VCC as an anti-corrosive film has been successfully prepared on the surface of many kinds of substrates such as steel [23][24][25], magnesium alloy [26], aluminium alloy [27][28][29] and zinc alloy [30]. Moreover, previous researches [28][29][30] reported that the constituents of the VCC are strongly associated with the compositions of vanadium-based passivation bath and process parameters of forming the VCC.…”

Influence of film thickness on structural and optical-switching properties of vanadium pentoxide films

“…4,5 Owing to their outstanding optical, electrical and thermal properties, V 2 O 5 thin films have been intensively exploited in many potential applications such as switching elements, smart windows, storage devices and terahertz modulators. [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] Thin films of V 2 O 5 with fairly good electrochemical performances were recently prepared by different deposition techniques, including sol-gel process, spray pyrolysis, thermal evaporation, electron beam evaporation, pulsed laser deposition (PLD), chemical vapour deposition, ion beam sputtering, and D.C. or R.F. sputtering.…”

“…sputtering. [6][7][8][9][10] And more importantly, reactive magnetron sputtering can prepare large and uniform films more easily than PLD or laser ablation, and can prepare higher quality films than sol-gel method or thermal evaporation method. Hence, in this study, reactive magnetron sputtering was used to prepare V 2 O 5 films.…”

“…4,5 Owing to their outstanding optical, electrical and thermal properties, V 2 O 5 thin films have been intensively exploited in many potential applications such as switching elements, smart windows, storage devices and terahertz modulators. 6-20…”