Effect of oxygen in diamond deposition at low substrate temperatures

Abstract

Articles you may be interested inEffect of oxygen on growth and properties of diamond thin film deposited at low surface temperature Effect of the substrate state on the formation of diamond film in a low temperature microwaveplasmaenhanced chemical vapor deposition system J. Vac. Sci. Technol. A 13, 1619 (1995); 10.1116/1.579740Temperature dependence of growth rate for diamonds grown using a hot filament assisted chemical vapor deposition method at low substrate temperatures

Electrical and reliability characteristics of copper-doped carbon (CuC) based resistive switching devices for nonvolatile memory applications

“…The CuC layer was deposited by radio frequency ͑rf͒ magnetron reactive sputtering using a Cu target in Ar, CH 4 , and O 2 at room temperature. 13,15 By controlling the flow rate of the gases we can optimize the composition and switching characteristics of the CuC layer. CH 4 gas is the source of the carbon and O 2 gas is used to enhance the decomposition of the CH 4 gas at room temperature.…”

Examination of the chemistry involved in microwave plasma assisted chemical vapor deposition of diamond

“…Possible sources of residual oxygen may be etching of the quartz reactor wall (most likely Ref. 21), leaks to the atmosphere (determined to be < 1 0~4 seem), and atmospheric water adsorbed on the inside walls of the reactor during substrate changes.…”

The formation of diamond-like carbon film at atmospheric pressure by the pulsed laser/plasma hybrid deposition method

“…In the other approaches similar to the PLD, the pulsed plasma deposition method has been broadly used for the formation of the DLC and other materials [6,11,12]. Due to the kinetic energy of the carbon particle in the high temperature plasma flow, the DLC film could be deposited on the substrate with the plasma [13][14][15].…”

“…A variety of the techniques has been developed to form the diamond-like carbon film in literature [1][2][3][4][5][6]. Pulsed laser deposition (PLD) is one of the methods with laser energy for DLC film deposition application in low pressure [4,5].…”