Effect of oxygen partial pressure on microstructural and optical properties of titanium oxide thin films prepared by pulsed laser deposition

Balakrishnan, G.; Bandi, Vengala Rao; Rajeswari, S.; Balamurugan, N. B.; Babu, R. Venkatesh; Song, Jung Il

doi:10.1016/j.materresbull.2013.07.009

Cited by 26 publications

(16 citation statements)

References 40 publications

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“…a significant increase in roughness: from 4.5 nm to 11.0 nm determined with droplets, and from 0.5 nm to 12.8 nm determined without droplets. The same relationship between roughness and gas pressure has been mentioned in many publications, where ceramic coatings were deposited by the PLD method [22][23][24][25][26]. It was explained by the relationship between the mobility of atoms and their kinetic energy [22,23,25,27].…”

Section: Methodsmentioning

confidence: 54%

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Piwowarczyk

Jędrzejewski

Baranowska

2017

Materials Science-Poland

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The paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.

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Section: Methodsmentioning

confidence: 54%

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Piwowarczyk

Jędrzejewski

Baranowska

2017

Materials Science-Poland

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“…1) at higher substrate temperatures. The PL peak intensity decreases systematically with the increased substrate temperature [9]. The variation of PL peak intensity is related to the formation of rutile and anatase phases at different substrate temperatures.…”

Section: Microstructural Studiesmentioning

confidence: 88%

“…At 873 K, two PL peaks were observed, indicating the clear anatase and rutile peaks. The small intense peak ∼ 470 nm (2.7 eV) is probably due to the structural defects, which are related to deep-level emissions like oxygen vacancy [9,11,12]. The PL peak intensity of TiO 2 films with respect to substrate temperature is associated with its crystallinity and defects.…”

Section: Microstructural Studiesmentioning

confidence: 99%

“…In the XRD pattern, A and R denotes the anatase and rutile phase of titania respectively [9]. The XRD results showed that the films were polycrystalline in nature and had tetragonal structure.…”

Section: Microstructural Studiesmentioning

confidence: 99%

“…The occurrence of anatase and rutile phase of TiO 2 thin films mainly depends on the deposition method, process parameters and substrate temperature. Many techniques are used to deposit TiO 2 films, including sol-gel processes [4], reactive evaporation [5], chemical vapor deposition [6], sputtering [7,8] and pulsed laser deposition (PLD) [9]. Among these techniques, pulsed laser deposition (PLD) is a simple technique to prepare high quality films from metal, semiconductors and ceramics.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition

Balakrishnan¹,

Manavalan²,

Babu³

et al. 2016

Nanosystems: Phys. Chem. Math.

Self Cite

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Titanium oxide (TiO 2 ) films were deposited on silicon (100) and quartz substrates at various substrate temperatures (300 -873 K) at an optimized oxygen partial pressure of 3.0 × 10 −2 mbar by pulsed laser deposition. The effect of substrate temperature on structure, surface morphology and optical properties of the films were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectroscopy (PL) respectively. The XRD results showed that the films are polycrystalline in nature and have tetragonal structure. The film prepared at higher substrate temperature showed strong rutile phase. The results indicated that all the films possess both phases (anatase and rutile) of titania. The AFM shows the crystalline nature, dense, uniform distribution of the nanocrystallites with a surface roughness of 2 -8 nm. The photoluminescence studies showed the asymmetric peak ∼ 370 nm indicating the bandgap for the TiO 2 films.

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Structural and Optical Properties of ZnO:Al Thin Films Produced by Magnetron Sputtering with Different Oxygen Flow: An Experimental and Ab Initio Study

Queiroz

Filho

Feitor

et al. 2020

Physica Status Solidi (a)

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This work addresses, in an experimental and theoretical way, the influence of different oxygen pressure values on the physical and electronic properties of thin conductive and transparent oxide films of Al‐doped ZnO, with different thicknesses. A series of characterization techniques, which include X‐ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), optical spectrophotometry, and Hall measurements are conducted. All films have a hexagonal wurtzite structure characteristic of ZnO, with preferential orientation along the plane (002) and transmittance values, in the visible range, greater than 80%. The increase in flow oxygen up to 25% provides an increase in the film's density resulting in a decrease in electrical resistivity from 9.58 × 10−3 Ω cm to 8.14 × 10−3 Ω cm. The ab initio calculations allow to observe the distortions in the microstructure of the films attributed to the presence of impurities and to obtain the values of the total and formation energies. The values of the Mulliken population and chemical bond length are notoriously influenced by the concentration of oxygen in the atmosphere. The displacement of the valence band (VB) and the Fermi level, together with the decrease in the gap energy, reinforce the influence of oxygen gas on the electronic structure of the films.

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Effect of oxygen partial pressure on microstructural and optical properties of titanium oxide thin films prepared by pulsed laser deposition

Cited by 26 publications

References 40 publications

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition

Structural and Optical Properties of ZnO:Al Thin Films Produced by Magnetron Sputtering with Different Oxygen Flow: An Experimental and Ab Initio Study

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