2004
DOI: 10.1016/j.mseb.2004.07.030
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Effect of P+ ions on the microstructure and the nature of the formed silicides in the Cr/Si system

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Cited by 1 publication
(2 citation statements)
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“…In accordance with its containing different amounts of Si electronic components can satisfy a wide range of required resistor values. [1][2][3] Many refractory metals of silicides offer several desirable physical and chemical properties, such as high melting point, good oxidation resistance, high strength and excellent creep resistance at elevated temperatures. 4,5 Furthermore, chromium silicides are mainly applied to the thin film resistors and heaters so that significant thermal energy occurs when the current of electrons passes over them.…”
Section: Introductionmentioning
confidence: 99%
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“…In accordance with its containing different amounts of Si electronic components can satisfy a wide range of required resistor values. [1][2][3] Many refractory metals of silicides offer several desirable physical and chemical properties, such as high melting point, good oxidation resistance, high strength and excellent creep resistance at elevated temperatures. 4,5 Furthermore, chromium silicides are mainly applied to the thin film resistors and heaters so that significant thermal energy occurs when the current of electrons passes over them.…”
Section: Introductionmentioning
confidence: 99%
“…Previous study has found that added chromium in the silicon of substrate materials, as opposed to silicon as a substrate material, have better characteristics, such as decreased resistance to contact electrodes and improved component driving currents. In accordance with its containing different amounts of Si electronic components can satisfy a wide range of required resistor values 1–3…”
Section: Introductionmentioning
confidence: 99%