2011
DOI: 10.1016/j.surfcoat.2011.04.071
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Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Abstract: The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO 2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parmeters have been inves… Show more

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Cited by 74 publications
(46 citation statements)
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“…As the frequency is increased from 300 to 900 Hz and the cathode peak current decreases from 520 to 120 A, the bias current to the substrate is reduced from 13 to 4 A, and the deposition rate increases from 45 to 80 nm/min (Figure 1). It has previously been suggested that with decreasing cathode peak current values, the degree of 6 ionisation of the metal in the plasma [33], as well as the ion energy distribution function is shifted towards lower values [34]. With a lower degree of ionisation of sputtered material, the back attraction is reduced, and as a consequence the deposition rate is increased [34][35][36].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…As the frequency is increased from 300 to 900 Hz and the cathode peak current decreases from 520 to 120 A, the bias current to the substrate is reduced from 13 to 4 A, and the deposition rate increases from 45 to 80 nm/min (Figure 1). It has previously been suggested that with decreasing cathode peak current values, the degree of 6 ionisation of the metal in the plasma [33], as well as the ion energy distribution function is shifted towards lower values [34]. With a lower degree of ionisation of sputtered material, the back attraction is reduced, and as a consequence the deposition rate is increased [34][35][36].…”
Section: Resultsmentioning
confidence: 99%
“…It has previously been suggested that with decreasing cathode peak current values, the degree of 6 ionisation of the metal in the plasma [33], as well as the ion energy distribution function is shifted towards lower values [34]. With a lower degree of ionisation of sputtered material, the back attraction is reduced, and as a consequence the deposition rate is increased [34][35][36]. Our observations are thus consistent with the literature, suggesting that also for the present target material, the degree of ionisation, and the number of ions reaching the substrate during each pulse, are decreased as the cathode peak current decreases.…”
Section: Resultsmentioning
confidence: 99%
“…A typical example of a reactively synthesized material system in which HiPIMS can be used to control the phase composition is TiO 2 . 11,[113][114][115][116] In general, TiO 2 films can grow in an amorphous and in two tetragonal crystalline structures; the rutile and the anatase phases, respectively. 117 The anatase phase exhibits interesting photocatalytic properties, 117 whereas the rutile phase exhibits one of the highest refractive indices in nature.…”
Section: B Phase Composition Tailoring By Hipimsmentioning
confidence: 99%
“…118 When HiPIMS is used, the rutile phase can be achieved even at room temperature, and the increase of the flux of energetic species toward the growing film favors the formation of the rutile at the expense of the anatase phase. 11,[113][114][115] This can be, for instance, achieved by increasing the peak target power (or current) 115,116 (see Fig. 9) or by decreasing the working pressure during deposition.…”
Section: B Phase Composition Tailoring By Hipimsmentioning
confidence: 99%
“…As such HiPIMS has been frequently utilized for the deposition of metal nitrides such as Al-N, [6] Cr-N, [7][8][9] Ti-N, [10] Nb-N, [11] etc. and metal oxide thin films such as TiO 2 , [12,13] Al 2 O 3 , [14,15] ZnO, [16] ZrO 2 , [17] and Fe 2 O 3 . [18,19] In these studies, it was observed that the properties of films deposited using reactive HiPIMS are superior.…”
Section: Introductionmentioning
confidence: 99%