2020
DOI: 10.1016/j.jssc.2019.121044
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Effect of pH in the hydrothermal preparation of monoclinic tungsten oxide

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Cited by 19 publications
(9 citation statements)
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“…In particular, WO 3 has a high oxidizing ability due to holes and has a good response to solar light (band gap of 2.5 to 3.0 eV). [18][19][20] However, WO 3 has a relatively low CB energy level and the photo-generated charge carriers can rapidly recombine. The construction of WO 3 and other semiconductors to form heterostructure photocatalysts has attracted substantial research interest for remarkably enhancing photocatalytic performance.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, WO 3 has a high oxidizing ability due to holes and has a good response to solar light (band gap of 2.5 to 3.0 eV). [18][19][20] However, WO 3 has a relatively low CB energy level and the photo-generated charge carriers can rapidly recombine. The construction of WO 3 and other semiconductors to form heterostructure photocatalysts has attracted substantial research interest for remarkably enhancing photocatalytic performance.…”
Section: Introductionmentioning
confidence: 99%
“…The band-gap energies of PWO-1.2 and WO 3 are calculated by the Kubelka-Munk transformation (αhν = A(hν-E g ) n/2 , where α, ν, E g , and A represent the absorbance, light frequency, band-gap energy, and a constant, respectively). [34] The n value depends on the characteristics of the transition in a semiconductor, and the n value of WO 3 is 1. [35] The band gaps of WO 3 and PWO-1.2 are 2.55 and 1.67 eV, respectively (Figure 5b).…”
Section: Chemistryselectmentioning
confidence: 99%
“…In the facile hydrothermal treatment -one-step and free of additives, several processing parameters that could be used as controlling parameters such as the acidity [9,18,19], reaction time [18,20,21], reaction temperature [18,[22][23][24]. By varying these parameters, researchers could manipulate the crystal structure and morphology of the products, which then affected the potential for applications.…”
Section: Introductionmentioning
confidence: 99%