Abstract:We report on the effect of phosphorus doping of silicon nanowires (SiNWs) on the photoinduced heating processes. SiNWs samples were prepared by metal-assisted chemical etching of low boron-doped crystalline silicon (c-Si) wafers followed with thermo-diffusional doping with phosphorous (P) up to 1020 cm-3. We establish that the P-doping (n-type) results in effective heat conduction along SiNWs toward the c-Si substrate during laser heating. Partial phase transition in P-doped SiNWs under intense photoheating wa… Show more
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