Effect of plasma nitriding on the properties of (Ti, Al)N coatings deposited onto hot work steel substrates

Gredić, T.; Zlatanović, M.; Popović, N.; Bogdanov, Ž.

doi:10.1016/0040-6090(93)90612-s

Cited by 42 publications

(5 citation statements)

References 9 publications

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“…[6][7][8][9][10] However, most of the metallic alloy coatings exhibit poor yield strengths and deform easily; their hardness rarely exceeds 10 GPa, in general, lower than the values of the nitride and oxide coatings of transition metals. To improve the resistance of the metallic coatings to mechanical damages, studies on the enhancement of film hardness by various nitridation processes [11][12][13][14][15][16][17][18] as well as the incorporation of solute elements [19][20][21][22][23][24] have been intensively conducted. Recently, an alloy system, called "high entropy alloys," with the addition of multiprincipal elements, has been developed, many of which possess simple solid solutions with nanocrystalline and even amorphous structures.…”

mentioning

confidence: 99%

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

Tsai

Shieu

Chang

et al. 2010

J. Electrochem. Soc.

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In this study, TiVCr and TiVCrZrY films were deposited on Si substrates by magnetron sputtering with the application of radio-frequency substrate bias of different powers from 0 to 15 W. The crystal structures, microstructure, and mechanical, electrical, and optical properties under the effect of bias were characterized. Both the TiVCr and TiVCrZrY films constructed simple solid solutions from all alloyed elements. The TiVCr films possessed a body-centered cubic crystal structure with a pyramid-like surface, while the TiVCrZrY films had a hexagonal close-packed crystal structure with a domelike surface. The microstructure and properties of the films varied with bias power. As the bias power increased, the microstructure of the films obviously changed from a porous to a dense columnar feature, and the density of the voids existing between the columns decreased. Accordingly, the physical properties of the films were improved. The hardness of the TiVCr and TiVCrZrY films was enhanced to about 11 and 14 GPa, and the electrical resistivity was lowered to 80 and 100 mu cm, respectively

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mentioning

confidence: 99%

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

Tsai

Shieu

Chang

et al. 2010

J. Electrochem. Soc.

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“…3-Complicated tool geometries are often manufactured using spark erosion, resulting in a quenched defect zone on the surface (the so called white layer), which often negatively affects adhesion of PVD coatings [7,8,9]. 4-For several molding and casting processes, hot work tool steels with relatively low hardness, i.e.…”

Section: Industrial Deposition Techniques For Molds and Diesmentioning

confidence: 99%

The role of PECVD hard coatings on the performance of industrial tools

Zarchi¹,

Ahangarani²,

Sanjari³

2014

Metall Mater Eng

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The advantages of the application of hard coatings, which are well knownfor cutting tools, are to a much lesser extent explored for casting, extrusion, molding and forming tools. Increasing the lifetime of these tools is an important task in surface engineering because of complex loading conditionsand often complicated tool geometry. The plasma-enhanced chemical vapor deposition (PECVD) technique is well suited to deposit hard coatings onto large dies and moulds. The aim of this study was to discuss deposition processes suitable for coating of the often large three-dimensional molds and dies used in metal forming. Furthermore, results obtained using different hard coatings in industrial applications for several case studies like aluminum pressure die-casting; plastics injection molding and sheet metal forming are presented and discussed. For best coating performance, a careful optimization of both substrate pretreatment and coating deposition is necessary. The plasma-enhanced chemical vapor deposition (PECVD) technique shows advantages for these applications because of the high flexibility in pre-treatment using chemical etching and plasma-nitriding, because of its ability to coat large complexly shaped tools and because of the possibility of deposition of low-chlorine containing low-friction coatings.

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“…이 낮은 밀 착력의 주원인은 DLC 박막의 높은 잔류응력과 다 른 기판의 화학적 친화력을 감소시키는 탄소-탄소 결합의 불안정성 때문이다 9) . DLC 박막의 강에 대한 계면 밀착력(adhesion)을 향상시키기 위한 연구가 진행되고 있으며, 대부분 의 연구는 모재와 DLC 박막 사이에 중간층(interlayer)을 형성시킴으로써 접착력을 향상시키고자 한 다 [10][11][12] . 이 중 플라즈마 질화처리는 금속모재의 경 도를 상승시키고 모재의 소성 변형을 억제시키기 때문에, DLC 박막이 파괴되지 않도록 DLC박막 증 착 전 전처리 과정으로 사용된다 [13][14][15][16] .…”

Section: 서 론unclassified

Study on the Adhesion of Diamond Like Carbon Films Using the Linear Ion Source with Nitriding Layers

Shin¹,

Park²,

Kwon³

et al. 2011

Journal of the Korean institute of surface engineering

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Diamond-like carbon (DLC) has many outstanding properties such as low friction, high wear resistance and corrosion resistance. However, it is difficult to achieve enough adhesion on the metal substrates because of weak bonding between DLC film and the metal substrate. The purpose of this study is to enhance an adhesion of DLC film. For improving adhesion, the substrate was treated by active screen plasma nitriding before DLC film deposing. Nitrided substrates were investigated by Glow Discharge Spectrometer (GDS), Micro-Vickers Hardness. DLC films were deposited on several metals by linear ion source, and characteristics of the films were investigated using nano-indentation, Field Emission Scanning Electron Microscope (FE-SEM). The adhesion was measured by scratch tester. The adhesion of DLC films was increased when nitriding layer was formed before DLC deposition. Therefore, the adhesion of DLC film can be enhanced as increasing the hardness of materials.

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Effect of plasma nitriding on the properties of (Ti, Al)N coatings deposited onto hot work steel substrates

Cited by 42 publications

References 9 publications

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

The role of PECVD hard coatings on the performance of industrial tools

Study on the Adhesion of Diamond Like Carbon Films Using the Linear Ion Source with Nitriding Layers

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