“…Article [5] contributes to studies on the effect of oxygen content in plasma composition on the concentration and size of silicon nanoclusters in amorphous a-SiO x :H + ncl-Si films using a unique technique of ultrasoft X-ray emission spectroscopy (USXES). Dielectric films containing nanocrystals (nc-Si) and nanoclusters (ncl-Si) of silicon are of great interest to researchers because, due to dimensional quantization, such films can produce photoand electroluminescence at 300 K. The authors presented the results of complex studies of the films, including data on USXES, X-ray diffractometry (XRD), Raman scattering, and Fourier-transform infrared spectroscopy (FTIR).…”