1998
DOI: 10.1063/1.368249
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Effect of plasma treatment on the density of defects at an amorphous Si:H-insulator interface

Abstract: Interface state density between a-Si:H and an insulating film (a-SiN 1.7 :H or a-SiO 2.0) was measured by photothermal deflection ͑PD͒ spectroscopy and electron spin resonance. While the interface state density in a-SiN 1.7 :H on a-Si:H structure was smaller than the free surface state density on a-Si:H, that in a-SiO 2.0 :H on a-Si:H structure was larger than the free surface state density of a-Si:H. The difference in the surface state density between these specimens was discussed in terms of plasma surface r… Show more

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Cited by 4 publications
(1 citation statement)
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“…On the other hand, TFTs with SiN as the gate dielectric, deposited at 300 C by PECVD, using SiH , H and NH , and at a rf power of 0.09 W/cm had of 9 cm /Vs (sample 3). Although the SiO / -Si : H interface state densities are higher than that of the SiN / -Si : H interface [23], the leakage currents were not significantly increased when SiO was used as the gate dielectric instead of SiN for the -Si : H TFTs. But, the and hence were also higher (0.5-1 cm /Vs compared to 0.2 cm /Vs) with of only 10-50 fA/ m, when SiO was the gate dielectric instead of SiN .…”
Section: Impact Of Other Process Conditionsmentioning
confidence: 96%
“…On the other hand, TFTs with SiN as the gate dielectric, deposited at 300 C by PECVD, using SiH , H and NH , and at a rf power of 0.09 W/cm had of 9 cm /Vs (sample 3). Although the SiO / -Si : H interface state densities are higher than that of the SiN / -Si : H interface [23], the leakage currents were not significantly increased when SiO was used as the gate dielectric instead of SiN for the -Si : H TFTs. But, the and hence were also higher (0.5-1 cm /Vs compared to 0.2 cm /Vs) with of only 10-50 fA/ m, when SiO was the gate dielectric instead of SiN .…”
Section: Impact Of Other Process Conditionsmentioning
confidence: 96%