2022
DOI: 10.3390/pr10122665
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Effect of Positive Bias and Pressure on Plasma Flow Characteristics in a Chemical Vapor Deposition Chamber

Abstract: To better understand how positive bias and deposition pressure affect the plasma flow properties in the deposition chamber during the bias-enhanced MPCVD process, a two-dimensional axisymmetric model based on the discharge mechanism of pure H2 was constructed. The coupling process between different physical field models of the electromagnetic field, plasma, and temperature field in the MPCVD reactor is realized. We studied the influence of positive bias voltage and deposition pressure variation on microwave pl… Show more

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