Effect of precursor concentration of microstructured titanium-di-oxide (TiO<sub>2</sub>) thin films and their photocatalytic activity

Rahman, Kazi Hasibur; Kar, Asit Kumar

doi:10.1088/2053-1591/ab3240

Cited by 6 publications

(6 citation statements)

References 44 publications

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“…For commercial use, it is very important to find a cost-effective and efficient technology for thin film deposition. TiO 2 films have been prepared using a variety of deposition methods such as chemical vapor deposition [4], sputtering [5], hydrothermal [6], electrophoretic [7], sol-gel [8,9], and spray pyrolysis [10,11]. Among the above-mentioned methods, deposition of thin films with ultrasonic spray pyrolysis has the advantage of being a simple, inexpensive method that allows us to obtain transparent homogeneous films with high stability and quality.…”

Section: Introductionmentioning

confidence: 99%

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

et al. 2019

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TiO2 thin films with different titanium isopropoxide (TTIP):acetylacetone (AcacH) molar ratios in solution were prepared by the chemical spray pyrolysis method. The TTIP:AcacH molar ratio in spray solution varied from 1:3 to 1:20. TiO2 films were deposited onto the glass substrates at 350 °C and heat-treated at 500 °C. The morphology, structure, surface chemical composition, and photocatalytic activity of the obtained TiO2 films were investigated. TiO2 films showed a transparency of ca 80% in the visible spectral region and a band gap of ca 3.4 eV irrespective of the TTIP:AcacH molar ratio in the spray solution. TiO2 films consist of the anatase crystalline phase with a mean crystallite size in the range of 30–40 nm. Self-cleaning properties of the films were estimated using the stearic acid (SA) test. A thin layer of 8.8-mM SA solution was spin-coated onto the TiO2 film. The degradation rate of SA as a function of irradiation time was monitored by Fourier-transform infrared spectroscopy (FTIR). An increase in the TTIP:AcacH molar ratio from 1:4 to 1:8 resulted in a ten-fold increase in the photodegradation reaction rate constant (from 0.02 to the 0.2 min−1) under ultraviolet light and in a four-fold increase under visible light.

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Section: Introductionmentioning

confidence: 99%

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

et al. 2019

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“…These spectra were used to determine the bandgap of the TiO 2 thin films. According to the Beer–Lambert law, T values and the absorption coefficient ( α ) are related by the following expression (1) [ 30 , 31 ]:

Section: Methodsmentioning

confidence: 99%

“…According to the Beer–Lambert law, T values and the absorption coefficient ( α ) are related by the following expression (1) [ 30 , 31 ]:

where d is the film thickness, obtained by profilometry in previous material optimization processes. In TiO 2 thin films, according to previously reported results, the absorption has an indirect transition ( n = 2) [ 30 , 31 ]. The optical band gap energy E g from the indirect transition can be estimated through the extrapolation of the linear part of the curve (h να) 1/2 vs h ν given by Equation (2), to zero

where α is estimated from (1) and A is a constant.…”

Section: Methodsmentioning

confidence: 99%

Sputtered Ultrathin TiO2 as Electron Transport Layer in Silicon Heterojunction Solar Cell Technology

2022

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This work presents the implementation of ultrathin TiO2 films, deposited at room temperature by radio-frequency magnetron sputtering, as electron-selective contacts in silicon heterojunction solar cells. The effect of the working pressure on the properties of the TiO2 layers and its subsequent impact on the main parameters of the device are studied. The material characterization revealed an amorphous structure regardless of the working pressure; a rougher surface; and a blue shift in bandgap in the TiO2 layer deposited at the highest-pressure value of 0.89 Pa. When incorporated as part of the passivated full-area electron contact in silicon heterojunction solar cell, the chemical passivation provided by the intrinsic a-Si:H rapidly deteriorates upon the sputtering of the ultra-thin TiO2 films, although a short anneal is shown to restore much of the passivation lost. The deposition pressure and film thicknesses proved to be critical for the efficiency of the devices. The film thicknesses below 2 nm are necessary to reach open-circuit values above 660 mV, regardless of the deposition pressure. More so, the fill-factor showed a strong dependence on deposition pressure, with the best values obtained for the highest deposition pressure, which we correlated to the porosity of the films. Overall, these results show the potential to fabricate silicon solar cells with a simple implementation of electron-selective TiO2 contact deposited by magnetron sputtering. These results show the potential to fabricate silicon solar cells with a simple implementation of electron-selective TiO2 contact.

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“…The effects of the argon/oxygen ratio on the crystallinity and surface chemical composition of TiO 2 films have been investigated in many studies [79,83,105,106,[110][111][112]. Oxygen plays an important role in the preparation of TiO 2 films via magnetron sputtering.…”

Section: Argon/oxygen Ratiomentioning

confidence: 99%

“…The authors attributed this to increases in the film thickness and grain size, which resulted in complete crystallinity. Rahman et al [111] shows the deposition of TiO 2 homogeneous highly porous thin films by hydrothermal method and enhanced photocatalytic degradation efficiency with increase in film thickness with the increase in titania precursor concentration. They also reported that the thickness can be determined from the transmittance spectra, which shows that the transmittance of the films decreases with film thickness.…”

Section: Deposition Timementioning

confidence: 99%

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Wang

Rahman

et al. 2020

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Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e., structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg), refractive index (n), transmittance (T), and extinction coefficient (k), of TiO2 films are dependent on the above- mentioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

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Effect of precursor concentration of microstructured titanium-di-oxide (TiO₂) thin films and their photocatalytic activity

Cited by 6 publications

References 44 publications

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

Sputtered Ultrathin TiO2 as Electron Transport Layer in Silicon Heterojunction Solar Cell Technology

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

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Effect of precursor concentration of microstructured titanium-di-oxide (TiO2) thin films and their photocatalytic activity

Cited by 6 publications

References 44 publications

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

Effect of the Titanium Isopropoxide:Acetylacetone Molar Ratio on the Photocatalytic Activity of TiO2 Thin Films

Sputtered Ultrathin TiO2 as Electron Transport Layer in Silicon Heterojunction Solar Cell Technology

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

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Effect of precursor concentration of microstructured titanium-di-oxide (TiO₂) thin films and their photocatalytic activity