Effect of random surface orientation on W sputtering yields

Jussila, J; Granberg, Fredric; Nordlund, K.

doi:10.1016/j.nme.2018.08.002

Cited by 16 publications

(11 citation statements)

References 27 publications

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“…Some specific phenomena have been addressed by MD such as preferential sputtering in alloys [244]: it is found that the lighter and the weaker bound species are sputtered preferentially. Retention of the sputtering ion in the target has drawn attention, especially for the application in Helium sputtering of fusion wall materials [240, 242 and The sputtering of complex (porous) materials [244][245][246] is also of interest since bombarding a soft material is expected to modify sputtering rates and sputtered species energy and angle distribution.…”

Section: Simulations Of Sputteringmentioning

confidence: 99%

Theory and molecular simulations of plasma sputtering, transport and deposition processes

2023

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The present review provides an overview of the basic theory of sputtering with recent models, focussing in particular on sputtered atom energy distribution functions. Molecular models such as Monte-Carlo, kinetic Monte-Carlo, and classical Molecular Dynamics simulations are presented due to their ability to describe the various processes involved in sputter deposition at the atomic and molecular scale as required. The sputter plasma, the sputtering mechanisms, the transport of sputtered material and its deposition leading to thin film growth can be addressed using these molecular simulations. In all cases, the underlying methodologies and some selected mechanisms are highlighted.

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Section: Simulations Of Sputteringmentioning

confidence: 99%

Theory and molecular simulations of plasma sputtering, transport and deposition processes

2023

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“…Ar ions with a kinetic energy of 60 eV were hitting the differently oriented surfaces perpendicularly. The ions were hitting a square box with the side length of 4 lattice constants, at 27 o C (300 K), similarly to previous studies on tungsten [18]. The interactions between Mo atoms were described by the Ackland et al potential [19], with the addition of Ziegler-Biersack-Littmark potential by Salonen et al [20].…”

Section: Modeling Of Crystal Lattice Effectsmentioning

confidence: 99%

“…Experiments and modeling were performed at ion energies close to the sputtering threshold of molybdenum. Under such conditions, the processes, usually dominating high-energy exposures, like ion channeling [18], are not playing a decisive role anymore. At the same time, the other processes involving e.g.…”

Section: Modeling Of Crystal Lattice Effectsmentioning

confidence: 99%

Optimization of single crystal mirrors for ITER diagnostics

Litnovsky

Peng

Kreter

et al. 2019

Fusion Engineering and Design

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Diagnostic mirrors are planned to be used in all optical diagnostics in ITER. Degradation of mirrors due to e.g. deposition of plasma impurities will hamper the entire performance of affected diagnostics. In situ mirror cleaning by plasma sputtering is presently envisaged for the recovery of contaminated mirrors.There are observations showing a signature of sputtering dependence on crystal orientation. Should such a dependence exist, the sputtering of single crystal mirrors could be minimized, thus prolonging a mirror lifetime.Four single crystal molybdenum mirrors with different orientations were produced to study the effect of crystal orientation on sputtering. Mirrors were exposed to argon plasma under identical plasma conditions relevant to those expected in the mirror cleaning systems of ITER. The energy of impinging ions was about 60 eV. The amount of sputtered material corresponded to about a hundred mirror cleaning cycles in argon.Plasma exposures did not affect the mirror reflectivity. The maximum decrease of specular reflectivity did not exceed 5% at 250 nm. The mirrors with orientations [110]/[101] demonstrated up to 42% less sputtering than the mirrors with other crystal orientations. These findings outline the advantage of a favorable crystal orientation for a cleaning of heavy contaminants from ITER mirrors.

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“…It is, however, known that the surface orientation will dramatically affect the sputtering yields [14][15][16]. At low energies the surface atomic configuration and surface energy of different orientations will affect the sputtering yields [17,18], and at high energies the channeling effects of ions will lower the sputtering yield dramatically compared to directions that are non-channeling [19]. In order to investigate the effect of certain orientations, there have been some systematic studies on the effect of surface orientation dependent sputtering.…”

Section: Introductionmentioning

confidence: 99%

Investigation of surface orientation dependent sputtering of Ag

Nilsson,

Choupanian,

Ronning

et al. 2023

J. Phys.: Condens. Matter

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Sputtering of metal surfaces can be both a beneficial phenomenon, for instance in the coating industry, or an undesired side-effect, for instant materials subjected to irradiation. While the average sputtering yields are well known in common metals, recent studies have shown that the yields can depend on the crystallographic orientation of the surface much stronger than commonly appreciated. In this study, we investigate by computational means, molecular dynamics, the sputtering of single crystalline Ag surfaces under various incoming energies. The results at low and high energy are compared to experimental results for single crystalline Ag nanocubes of different orientations. We observe strong differences between the sputtering yields of different surface directions and ion energies. We analyze the results in terms of the atom cluster size of the sputtered materials, and show that the cluster size distribution is a key factor to understand the correspondence between simulations and experiments. At low energies mainly single atoms are sputtered, whereas at higher energies the sputtered material is mainly in atom clusters.

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Effect of random surface orientation on W sputtering yields

Cited by 16 publications

References 27 publications

Theory and molecular simulations of plasma sputtering, transport and deposition processes

Theory and molecular simulations of plasma sputtering, transport and deposition processes

Optimization of single crystal mirrors for ITER diagnostics

Investigation of surface orientation dependent sputtering of Ag

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