Effect of silver ion-induced disorder on morphological, chemical and optical properties of poly (methyl methacrylate)

Arif, Shafaq; Saleemi, Farhat; Rafique, Muhammad; Naab, F.; Toader, Ovidiu; Mahmood, Asif; Aziz, Uzma

doi:10.1016/j.nimb.2016.09.024

Cited by 17 publications

(4 citation statements)

References 43 publications

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“…These changes is attributed to the oxidation reactions, the chain scission and the formation of free radicals. 26 Figures 5a-5d displays the morphology of both the untreated and irradiated CA/PANI composites (a-d). Figure 5a shows the PANI organized in a granular shape within the CA matrix, with white dots dispersed across the CA surface.…”

Section: Resultsmentioning

confidence: 99%

Impacts of Low Energy Argon Beam on Enhancing the Surface Wettability and Electrical Performance of CA/PANI Films

Altuijri,

Atta,

Abdeltwab

et al. 2024

ECS J. Solid State Sci. Technol.

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This work study the effects of argon beam irradiation on surface properties of CA/PANI films using cold cathode source with varying ion fluences (4×1014, 8×1014, and 12×1014 ions/cm2). The EDX, SEM and FTIR methods verified successful fabrication of the composites. Surface free energy, contact angle, and work of adhesion were measured for both the pure and irradiated films. Raising the ion flux from 4x1014 ions.cm-2 to 12x1014 ions.cm-2 it decreases the contact angle of CA/PANI from 62.1o to 43.4o and increases the surface free energy from 46.7 to 63.9 mJ/m2. The results showed that the CA/PANI changed after exposed to radiation, proving that the irradiated surface properties were improved. In addition, their electrical conductivity was tested in the frequency range of 50 to106 Hz for CA/PANI films. When subjected to 12x1014 ions.cm-2, the conductivity rose from 1.1×10-8 S/cm for CA/PANI to 6.5×10-7 S/cm. The results showed that the irradiated CA/PANI had better electrical and surface properties, which is crucial for many devices including batteries and supercapacitors

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Section: Resultsmentioning

confidence: 99%

Impacts of Low Energy Argon Beam on Enhancing the Surface Wettability and Electrical Performance of CA/PANI Films

Altuijri,

Atta,

Abdeltwab

et al. 2024

ECS J. Solid State Sci. Technol.

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“…4b). Due to the ion-induced structural damages, amorphization and carbon clusterization during the Si + -ion implantation, a carbonaceous material, namely hydrogenated amorphous carbon (a-C:H) is produced in the ion-implanted layer [15,18,58,[60][61][62][63][64][65][66][67]. The nanoclusters contain mainly sp 2 -bonded carbon atoms with some dangling bonds and broken chain segments.…”

Section: Resultsmentioning

confidence: 99%

“…The nanoclusters contain mainly sp 2 -bonded carbon atoms with some dangling bonds and broken chain segments. The number, size and organization of sp 2 clusters define the extent of modification in optical and electronic properties of a-C:H [63,65,66,68]. The formation of nanoclustered structures and distinct carbonaceous subsurface layer #2 in the considered Si + -implanted PMMA was evidenced by UV-VIS, photoluminescence and Raman spectroscopy studies [37,69].…”

Section: Resultsmentioning

confidence: 99%

Near-Surface Nanostructuring of Polymethylmethacrylate by Silicon Ion Implantation

Hadjichristov

Ivanov

2022

JNanoR

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The properties of organic polymers implanted with low-energy ions are of scientific and practical interest. In this work, we consider the nanostructure produced in the near-surface region of polymethylmethacrylate (PMMA) implanted with silicon (Si+) ions at energy of 50 keV and ion fluence of 1016 ions/cm2. By controlled local chemical modification in a depth of 150 – 200 nm, in PMMA was created a nano-thin bi-layer configuration consisting of ion-modified layer and ion-implanted layer with carbonaceous nanostructure. Such complex nanoscale arrangement and organic transconductance configuration was characterized by direct current electrical measurements. The field-effect configuration in Si+-implanted PMMA was driven through the formed ion-implanted buried planar layer (as a channel with a thickness of about 100 nm) of nanoclustered amorphous carbon as an organic semiconductor. The values of performance parameters, such as the charge carrier mobility, contact resistance and gate leakage current of this particular type of organic field-effect transistor configuration were determined.

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“…No processo de polimerização ocorre a quebra da dupla ligação, fazendo com que esse sinal não apareça no espectro do PMMA. Tal sinal desaparece para algumas amostras após a implantação [38][39][40]. Após a implantação de nitrogênio, observa-se a presença de aminas em 1654 e 655 cm -1 e entre 3300-3700 cm -1 [41].…”

Section: Materiais E Métodosunclassified

Implantação de Íons de Nitrogênio em PMMA Através de uma Fonte Kaufman

Fontoura¹,

Wanke²,

Aguzzoli³

2017

Sci. cum Ind.

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ResumoA modificação de superfícies é uma técnica que a engenharia tem feito uso há muito tempo, para melhoria de propriedades em materiais. O poli metil-metacrilato (PMMA), por ser um material de constante uso em aplicações biomédicas, exige que sua superfície apresente características favoráveis à adesão celular e compatibilidade com tecidos. Os polímeros, de uma maneira geral, quando submetidos a tratamentos em plasma, tendem a formar grupos funcionais que alteram propriedades ópticas, químicas, físicas e de biocompatibilidade. Em função disso, este trabalho propôs realizar a funcionalização de substratos de PMMA através da fonte de íons Kaufman. Amostras de PMMA foram submetidas ao feixe de íons de nitrogênio gerado pela fonte Kaufman, em diversas condições. A caracterização foi feita pelas técnicas de GD-OES, FTIR e EDS. Ficou comprovado, através do perfil de concentração de nitrogênio obtido por GD-OES, que a quantidade de nitrogênio na superfície aumenta gradativamente com o tempo de implantação e a potência. Outro indício foi a análise em FTIR, que mostrou presença de aminas nas faixas entre 1654-655 cm -1 e 3300-3700 cm -1 . A análise em EDS, porém, comprovou também a presença de ferro e cromo, agentes citotóxicos, que precisam ser eliminados para a continuidade dos trabalhos. Palavras-chaveImplantação de íons de nitrogênio, fonte de íons Kaufman, modificação superficial de PMMA Implantation of Nitrogen Ions through a Kaufman Ion Source AbstractSurface modification is a technique that engineering has been using for a long time, in order to improve the properties of materials. Poly (methyl methacrylate) (PMMA), for being a material of constant use in biomedical applications, demands that its surface offers favorable characteristics in cell adhesion and tissue compatibility. Polymers, generally speaking, when submitted to plasma treatments, tend to form functional groups that alter optical, chemical, physical and biocompatibility properties. Taking all of this into consideration, this work proposed to functionalize PMMA substrates through a Kaufman ion source. PMMA samples were submitted to a nitrogen ion beam generated through the Kaufman source, in different conditions. Characterization was carried out by the techniques of GD-OES, FTIR and EDS. It was proved, through nitrogen concentration profile obtained by GD-OES, that the amount of nitrogen in the surface increased gradually with implantation time and supplied power. The FTIR analysis was another evidence of nitrogen presence, as amines were detected in the bands between 1654-655 cm -1 and 3300-3700 cm -1 . The EDS analysis, though, proved that iron and chromium, cytotoxic agents, are also present and therefore, they must be eliminated from the process, so that future studies can be carried out.

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Effect of silver ion-induced disorder on morphological, chemical and optical properties of poly (methyl methacrylate)

Cited by 17 publications

References 43 publications

Impacts of Low Energy Argon Beam on Enhancing the Surface Wettability and Electrical Performance of CA/PANI Films

Impacts of Low Energy Argon Beam on Enhancing the Surface Wettability and Electrical Performance of CA/PANI Films

Near-Surface Nanostructuring of Polymethylmethacrylate by Silicon Ion Implantation

Implantação de Íons de Nitrogênio em PMMA Através de uma Fonte Kaufman

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