2015
DOI: 10.1109/ted.2015.2392763
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Effect of SiO<sub>2</sub> and SiO<sub>2</sub>/SiN<sub><italic>x</italic></sub> Passivation on the Stability of Amorphous Indium-Gallium Zinc-Oxide Thin-Film Transistors Under High Humidity

Abstract: We studied the environmental stability of amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) with single-layer (SiO 2 ) and bilayer (SiO 2 /SiN x ) passivation under high-humidity (80%) storage. During the 30 days of investigation, all single-layer passivated TFTs showed negative turn-ON voltage shifts ( V ON ), the size of which increased with storing time. The negative V ON is attributed to donor generation inside the active a-IGZO caused by the diffusion of ambient hydrogen/water mole… Show more

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Cited by 74 publications
(59 citation statements)
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“…On the contrary, the wet sample exhibits different behavior. It has been known that water acts as donor-like states in the a-IGZO active layer for a small amount of exposure to water [14]. In this case, an assumption for the role of the water is that there is no chemical reaction between water and the a-IGZO active layer.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…On the contrary, the wet sample exhibits different behavior. It has been known that water acts as donor-like states in the a-IGZO active layer for a small amount of exposure to water [14]. In this case, an assumption for the role of the water is that there is no chemical reaction between water and the a-IGZO active layer.…”
Section: Resultsmentioning
confidence: 99%
“…It is necessary to investigate the effect of the long-period exposure to ambient water on the active layer, because the stability also critically depends on the exposure time of the ambient. In addition, the ambient effect should be studied for a very long time over several years under moderate-humidity conditions, which is the typical TFT operation condition in practical applications [14]. However, it is impossible to perform the humidity stability experiments such a long time in a research level.…”
Section: Introductionmentioning
confidence: 99%
“…As previously reported, adsorption of H 2 O molecules in the ambient (relative humidity larger than 40%) causes significant negative threshold voltage (V th ) shifts in unpassivated oxide-based TFTs. [18][19] In this study, the experiment was performed in air with relative humidity of 60%. To discuss more insight into the interaction of O 2 molecules and avoid H 2 O adsorption on ZTO films at the initial state of TFT devices, all devices were put into a vacuum chamber (3 × 10 −5 torr) for 6 hour and then dry O 2 gas was vented into the chamber until the chamber pressure reached 760 torr.…”
Section: Resultsmentioning
confidence: 99%
“…This observation clearly indicates that adsorption of oxygen will not affect the ZTO TFT performance; nevertheless, as reported in the literature, water molecules in air (60% relative humidity) adsorbed on ZTO surface act as electron donors and consequently increase electron carriers in ZTO channel layers. 19,[28][29] On the other hand, the V th and I D-off of 5 nm-thick ZTO TFT do not change apparently despite in air, dry O 2 or vacuum. All three devices are not passivated on the back surface.…”
Section: -24mentioning
confidence: 99%
“…For type A sample, once the passivation is done, it can be hardly affected by the moisture in the ambient. Since the SiN x passivation layer is a good barrier to block water vapor [21], [22], even with a thermal annealing, the residual H 2 O molecules still cannot escape from the device. While for type B sample without a SiN x passivation, the residual H 2 O molecules could be removed during the annealing process.…”
Section: A Unified Degradation Model Of Nbs and Nbis A Nbsmentioning
confidence: 99%