Effect of solution concentration on the structural, optical and electrical properties of SnO2 thin films prepared by spray pyrolysis

Allag, A.; Rahmane, Saâd; Ouahab, Abdelouahab; Abdelmalek, Nadjate; Gasmi, Brahim

doi:10.1016/j.ijleo.2015.11.232

Cited by 67 publications

(40 citation statements)

References 27 publications

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“…For commercial uses, the polymeric materials should have good physical and mechanical properties, low cost production, high stability and low specific gravity [ 2 , 3 ]. The surface morphology of polymeric materials can be controlled by various parameters such as temperature [4] , concentration [5] , film thickness and structure [6] and dopant concentration. Poly(vinyl chloride), PVC, has various commercial and industrial applications [7] .…”

Section: Introductionmentioning

confidence: 99%

Fabrication of ordered honeycomb porous poly(vinyl chloride) thin film doped with a Schiff base and nickel(II) chloride

Hashim

El‐Hiti

Alotaibi

et al. 2018

Heliyon

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A modified poly(vinyl chloride) honeycomb thin film containing a low concentration of a thiadiazole Schiff base and nickel(II) chloride was successfully fabricated using the casting process. The surface morphology of the synthesized thin film was investigated using the scanning electronic microscopy. The synthesized poly(vinyl chloride) thin film was found to have a homogeneous surface morphology with a high crystalline nature. The addition of nickel(II) chloride was discovered to be vital for the formation of the honeycomb like structure.

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Section: Introductionmentioning

confidence: 99%

Fabrication of ordered honeycomb porous poly(vinyl chloride) thin film doped with a Schiff base and nickel(II) chloride

Hashim

El‐Hiti

Alotaibi

et al. 2018

Heliyon

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“…Помимо основной фазы SnSe на рентгенограмме (рис. 4) можно наблюдать рефлекс при 2θ = 42.76 • , идентификация которого позволила отнести его к тетрагональной кристаллической фазе (P4 2 /mnm) [41,42] с параметрами элементарной ячейки a = b = = (4.736 ± 0.002) ¦ , c = (3.192 ± 0.002) ¦ [42][43][44].…”

Section: результаты и обсуждениеunclassified

Состав, структура, полупроводниковые свойства химически осажденных пленок SnSe

Маскаева¹,

Федорова²,

Марков³

et al. 2019

Физика И Техника Полупроводников

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High adhesion tin monoselenide SnSe layers with a thickness of up to 200 ± 10 nm have been prepared by hydrochemical deposition from a trilonate reaction mixture. It was revealed by the X-ray diffraction method that the synthesized films crystallize in the orthorhombic system (S. G. Pnma). The presence of a significant amount of oxygen in the surface layers of the films is explained by partial oxidation of the samples with the formation of the SnO2 phase. The results of ion etching to a depth of 18 nm showed a sharp decrease in the oxygen content with depth and actual correspondence of the elemental composition to SnSe. According to the results of optical studies, the band gap was found to be 1.69 eV for direct type of transitions, respectively. The synthesized SnSe layers have a hole-type conductivity typical of this material.

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“…The SnO 2 thin layers have been extensively prepared by employing different procedures like dual-beam pulsed laser deposition (DB-PLD) [22], spray pyrolysis [23], magnetron sputtering [24], molecular beam epitaxy (MBE) [25], and sol-gel method [26], which will be used with the spin coating to prepare our thin films; the reason this was chosen was because of its several advantages: its simplicity, low cost, and its ability to generally obtain uniform films with good adherence and reproducibility [27]. Until now, impurities for doping SnO 2 thin films have been applied by other researchers such as fluorine (F), antimony (Sb), copper (Cu), nickel (Ni), cobalt (Co), aluminum (Al), and Indium (In) [28][29][30][31][32][33][34].…”

Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of Nickel and Aluminum-Codoped SnO2 Thin Films for Optoelectronic Applications

Bouabdalli

Jouad

Garmim

et al. 2021

International Journal of Photoenergy

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In this study, the coating technique was used to prepare thin layers of nickel and aluminum-codoped tin oxide (SnO2: Ni; Al). This study is aimed at exploring the influence of aluminum (Al) dopant on the structural, optical, and electrical properties of the elaborated films. X-ray diffraction (XRD) studies discovered that all deposited films (Ni-doped and Al-Ni-codoped SnO2) were polycrystalline with tetragonal (quadratic) structure and exhibited [110] preferential orientation. The optical measurements exposed that all prepared films have presented good transparency. The transmittance of Ni-Al-codoped SnO2 thin films in the visible and near-infrared regions varied between 80% and 90%; this was dependent on the concentration of dopant. The band gap was determined via the equation related to the absorption coefficient. It was deduced that the optical band gap values of thin films gradually decreased from 4.084 eV to 3.991 eV, as an effect of Al content. In addition, it was concluded that the thickness values of the films pass from 571.374 nm to 694.036 nm as an effect of Al content. Moreover, the extinction coefficient decreases with the wavelength in the UV region and then varies slightly towards longer wavelengths. Moreover, the electrical resistivity was determined using the four-point probe; it was determined that the electrical resistivity decreases from 1.35 × 10 3 Ω · cm to 0.14 × 10 3 Ω · cm with aluminum concentration increasing from 0 at. % to 7 at. %. The elaborated films of SnO2 codoped with Ni and Al present were highly transparent; therefore, these thin layers look promising in the use of the window layer in PV solar cells.

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Effect of solution concentration on the structural, optical and electrical properties of SnO2 thin films prepared by spray pyrolysis

Cited by 67 publications

References 27 publications

Fabrication of ordered honeycomb porous poly(vinyl chloride) thin film doped with a Schiff base and nickel(II) chloride

Fabrication of ordered honeycomb porous poly(vinyl chloride) thin film doped with a Schiff base and nickel(II) chloride

Состав, структура, полупроводниковые свойства химически осажденных пленок SnSe

Preparation and Characterization of Nickel and Aluminum-Codoped SnO2 Thin Films for Optoelectronic Applications

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