Effect of space angle on constriction resistance and contact resistance for a point contact

Sano, Yukako

doi:10.1063/1.335897

Cited by 16 publications

(5 citation statements)

References 5 publications

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“…In the specific case of self-similar tips (Berkovich, cube-corner and conical geometries), simple geometrical considerations show that this resistance evolves as the reciprocal of the contact radius 𝑟 𝑐 (Eq. 6) (adapted from [50]).…”

Section: Importance Of Contact Area In Nanoindentation -Effect Of Mat...mentioning

confidence: 99%

Resistive-nanoindentation on gold: Experiments and modeling of the electrical contact resistance

Volpi

Rusinowicz

Comby-Dassonneville

et al. 2021

Review of Scientific Instruments

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This paper reports the experimental, analytical and numerical study of resistive-nanoindentation tests performed on gold samples (bulk and thin film). First the relevant contributions to electrical contact resistance are discussed and analytically described. A brief comparison of tests performed on gold and on natively-oxidized metals highlights the high reproducibility and the voltage-independence of experiments on gold (thanks to its oxide-free surface). Then the evolution of contact resistance during nanoindentation is fully explained in terms of electronic transport regimes: starting from tunneling, electronic transport is then driven by ballistic conduction before ending with pure diffusive conduction. The corresponding analytical expressions, as well as their validity domains, are determined and compared with experimental data, showing excellent agreement. From there, focus is made on the diffusive regime.Resistive-nanoindentation outputs are fully described by analytical and finite-element modeling. The developed numerical framework allows a better understanding of the main parameters: it first assesses the technique capabilities (validity domains, sensitivity to tip defect, sensitivity to rheology, effect of an oxide layer,…), but it also validates the different assumptions made on current line distribution. Finally it is shown that a simple calibration procedure allows a well-resolved monitoring of contact area during resistive-nanoindentation performed on samples with complex rheologies (ductile thin film on elastic substrate).Comparison to analytical and numerical approaches highlights the strength of resistivenanoindentation for continuous area monitoring.

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Section: Importance Of Contact Area In Nanoindentation -Effect Of Mat...mentioning

confidence: 99%

Resistive-nanoindentation on gold: Experiments and modeling of the electrical contact resistance

Volpi

Rusinowicz

Comby-Dassonneville

et al. 2021

Review of Scientific Instruments

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show abstract

“…For the most real contact surfaces, the average space angle of asperities are generally less than 20° [13], this will result in an increase on the electrical resistance at most 4.6% only.…”

Section: ) Asperity Anglementioning

confidence: 99%

“…Furthermore, Sano [13,14] investigated the effect of the space angle on the constriction resistance. The space angle was defined as the angle made by the asymptote surface with the extension of the contact surface (see Fig.…”

Section: Introductionmentioning

confidence: 99%

“…1. Asperity model suggested by Sano [13] Considering rough surfaces of the contact bump and the drain electrode in microswitches, an asperity in contact should have a height, and the side of asperity then has an angle with 978-1-4673-5281-9/13/$31.00 ©2013 IEEE respect to the surface plane. Motivated by this, a 3-dimensional (3D) model is proposed in this paper.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

An Asperity-Based Finite Element Model for Electrical Contact of Microswitches

Liu

Leray

Pons

et al. 2013

2013 IEEE 59th Holm Conference on Electrical Contacts (Holm 2013)

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Abstract-Precise prediction of electrical contact resistance is important for microswitches. The contact spot used to be considered as a circle in earlier literature, where there was only one geometrical parameter: the radius of the a-spots. However, a real contact asperity has a height and an angle with the interface. In this paper, a 3-dimensional cone-truncated geometry is used to model an asperity, and three parameters are defined: radius, height and the angle of the side with respect to the surface plane. The ranges of their values are extracted from AFM measurement of samples in Au and Ru, and the values match well with the previous mechanical simulation results.Compared to the theoretical results, the finite element (FE) model showed a good capability to predict contact resistance in the diffusive regime, but underestimated it in the ballistic regime. The effects of angle and height of the asperity were investigated for Au-Ru contact in terms of contact resistance, maximum temperature and its location. Regarding multiple spots in contact, this work investigated the influence of the number of spots and their distributions for contact resistance and local Joule heating.

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“…Efforts to achieve reliable junctions in nanodevices can be considered as obtaining lower metal-metal or metal-semiconductor contact resistance. It has been reported that the contributions to contact resistance include micro-scale geometry [1][2][3][4][5], oxide layer of semiconductor materials [6,7], difference of Fermi energy between nanomaterials and electrodes [8], and contact force between two metal films [3]. Furthermore, dependence on contact force [3,9] was investigated, as well as dependence on contact length [10], to understand characteristics of contact resistance.…”

Section: Introductionmentioning

confidence: 99%

Normalized Contact Force to Minimize "Electrode-Lead" Resistance in a Nanodevice

Lee¹,

Bae²,

Lee³

et al. 2014

Bulletin of the Korean Chemical Society

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In this report, the contact resistance between "electrode" and "lead" is investigated for reasonable measurements of samples' resistance in a polypyrrole (PPy) nanowire device. The sample's resistance, including "electrode-lead" contact resistance, shows a decrease as force applied to the interface increases. Moreover, the sample's resistance becomes reasonably similar to, or lower than, values calculated by resistivity of PPy reported in previous studies. The decrease of electrode-lead contact resistance by increasing the applying force was analyzed by using Holm theory: the general equation of relation between contact resistance (R H ) of two-metal thin films and contact force (

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Effect of space angle on constriction resistance and contact resistance for a point contact

Cited by 16 publications

References 5 publications

Resistive-nanoindentation on gold: Experiments and modeling of the electrical contact resistance

Resistive-nanoindentation on gold: Experiments and modeling of the electrical contact resistance

An Asperity-Based Finite Element Model for Electrical Contact of Microswitches

Normalized Contact Force to Minimize "Electrode-Lead" Resistance in a Nanodevice

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