2021
DOI: 10.1109/jeds.2021.3120661
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Effect of Statistical Dopant Fluctuations on Threshold Voltage of Emerging Devices

Abstract: This paper presents a comparative study on the effect of statistical dopant fluctuations on threshold voltage (V th ) of emerging and conventional metal-oxide-semiconductor (MOS) field-effect (FET) transistors (MOSFETs). In this context, three n-channel MOSFET structures representing three different complementary MOS (CMOS) technologies at the 20 nm node are considered. The structures represent a conventional device with symmetric halo or pocket regions around the n + source-drain formed by a single p-type dop… Show more

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