2006
DOI: 10.1103/physrevlett.96.166104
|View full text |Cite
|
Sign up to set email alerts
|

Effect of Step Stiffness and Diffusion Anisotropy on the Meandering of a Growing Vicinal Surface

Abstract: We study the step meandering instability on a surface characterized by the alternation of terraces with different properties, as in the case of Si(001). The interplay between diffusion anisotropy and step stiffness induces a finite wavelength instability corresponding to a meandering mode. The instability sets in beyond a threshold value which depends on the relative magnitudes of the destabilizing flux and the stabilizing stiffness difference. The meander dynamics is governed by the conserved Kuramoto-Sivashi… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

3
58
0

Year Published

2007
2007
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 41 publications
(61 citation statements)
references
References 28 publications
(53 reference statements)
3
58
0
Order By: Relevance
“…Second, due to the Ehrlich-Schwoebel effect the kinetic coefficients k (±) D for adatom attachment from the different sides of a step may now differ, which is the physical origin for the morphological (known as meandering) instability, first elucidated by Bales and Zangwill [59]. Within a quasistationary approximation in which concentration at terraces is taken to relax faster than any other process and assuming a weak ES effect, it has recently been shown [58] that the effective interface equation for an isolated step has the following form in non-dimensional units:…”
Section: Domain Coarsening: Epitaxial Growth Of Vicinal Surfacesmentioning
confidence: 99%
See 1 more Smart Citation
“…Second, due to the Ehrlich-Schwoebel effect the kinetic coefficients k (±) D for adatom attachment from the different sides of a step may now differ, which is the physical origin for the morphological (known as meandering) instability, first elucidated by Bales and Zangwill [59]. Within a quasistationary approximation in which concentration at terraces is taken to relax faster than any other process and assuming a weak ES effect, it has recently been shown [58] that the effective interface equation for an isolated step has the following form in non-dimensional units:…”
Section: Domain Coarsening: Epitaxial Growth Of Vicinal Surfacesmentioning
confidence: 99%
“…Following the seminal work of Burton, Cabrera and Frank [2,9], a MB problem can be formulated in which diffusion of adatoms takes place on terraces, step motion being due to the resulting diffusive fluxes at the step. In the absence of adatom evaporation on terraces and for a constant driving adatom flux F on the terraces, one has the following MB problem [58]:…”
Section: Domain Coarsening: Epitaxial Growth Of Vicinal Surfacesmentioning
confidence: 99%
“…The former is the celebrated Kuramoto-Sivashinsky (KS) equation [27,28], paradigmatic of spatiotemporal chaos, for which a (disordered) short-range pattern develops with a wavelength that does not coarsen, kinetic roughening occuring at much larger scales [29]. The 1 ¼ 0 case is the ''conserved'' KS equation (CKS), appearing, for dynamics of amorphous thin films [13] and steps on vicinal surfaces [30], for which the linear instability leads to an ordered pattern of paraboloids with uninterrupted coarsening.…”
mentioning
confidence: 99%
“…Recently, T. Frisch and A. Verga have found [15,16] that in special limits 1 the profile u(x, t) of the wandering steps satisfies the equation…”
Section: Introductionmentioning
confidence: 99%
“…The propagative term can be removed using the transformation u → u + (γ/2)x, which, however, introduces γ−dependent boundary conditions [17]. Numerics and heuristic/similarity arguments give a coarsening pattern whose typical length scale grows asl ∼ t n , with a coarsening exponent n = 1 2 , both in the presence [17,18] and in the absence [15] of the propagative term.…”
Section: Introductionmentioning
confidence: 99%